Maskless lithography: a low-energy electron-beam direct writing system with a common CP aperture, and recent progress

Tetsuro Nakasugi; Atsushi Ando; Ryoichi Inanami; Noriaki Sasaki; Takumi Ota; Osamu Nagano; Yuuichiro Yamazaki; Kazuyoshi Sugihara; Ichiro Mori; Motosuke Miyoshi; Katsuya Okumura; Akira Miura

doi:10.1117/12.483607

16 June 2003 Maskless lithography: a low-energy electron-beam direct writing system with a common CP aperture and the recent progress

Tetsuro Nakasugi, Atsushi Ando, Ryoichi Inanami, Noriaki Sasaki, Takumi Ota, Osamu Nagano, Yuuichiro Yamazaki, Kazuyoshi Sugihara, Ichiro Mori, Motosuke Miyoshi, Katsuya Okumura, Akira Miura

Author Affiliations +

Proceedings Volume 5037, Emerging Lithographic Technologies VII; (2003) https://doi.org/10.1117/12.483607
Event: Microlithography 2003, 2003, Santa Clara, California, United States

Abstract

In order to realize SoC (System on a Chip) fabrication at low cost with quick-TAT (Turn-Around-Time) we have proposed a maskless lithography (ML2) strategy, a low-energy electron-beam direct writing (LEEBDW) system with a common character projection (CP) aperture. This paper presents a status report on our proof-of-concept (POC) system. We have developed a compact EB column consisting small electrostatic lenses and deflectors. The experimental results for our POC system indicated that the patterns corresponding to 50nm-node logic devices can be obtained with CP exposure at the incident energy of 5 keV. The technique to reduce the raw process time using a SEM function of LEEBDW system is also reported.

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Tetsuro Nakasugi, Atsushi Ando, Ryoichi Inanami, Noriaki Sasaki, Takumi Ota, Osamu Nagano, Yuuichiro Yamazaki, Kazuyoshi Sugihara, Ichiro Mori, Motosuke Miyoshi, Katsuya Okumura, and Akira Miura "Maskless lithography: a low-energy electron-beam direct writing system with a common CP aperture and the recent progress", Proc. SPIE 5037, Emerging Lithographic Technologies VII, (16 June 2003); https://doi.org/10.1117/12.483607

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