Resist hardening without surface deviation

Holger Hartung; Matthias Cumme; Mike Thieme; Ernst-Bernhard Kley; Andreas Tuennermann

doi:10.1117/12.505797

3 November 2003 Resist hardening without surface deviation

Holger Hartung, Matthias Cumme, Mike Thieme, Ernst-Bernhard Kley, Andreas Tuennermann

Proceedings Volume 5183, Lithographic and Micromachining Techniques for Optical Component Fabrication II; (2003) https://doi.org/10.1117/12.505797
Event: Optical Science and Technology, SPIE's 48th Annual Meeting, 2003, San Diego, California, United States

Abstract

We report on a novel technique for hardening micro-optical resist elements, like beam-shaping elements or micro lenses, with large profile depths before proportional transfer into the fused silica substrate. This technique allows to harden the resist with only small distorsions of the height profile. For demonstration a refractive beam shaper was designed and fabricated in photo-resist using gray-tone lithography. This element was transfered into fused silica with high etch rates using an optimized set of parameters in an ICP-etcher.

Citation Download Citation

Holger Hartung, Matthias Cumme, Mike Thieme, Ernst-Bernhard Kley, and Andreas Tuennermann "Resist hardening without surface deviation", Proc. SPIE 5183, Lithographic and Micromachining Techniques for Optical Component Fabrication II, (3 November 2003); https://doi.org/10.1117/12.505797

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