Impact of resist blur on MEF, OPC, and CD control

Timothy A. Brunner; Carlos Fonseca; Nakgeuon Seong; Martin Burkhardt

doi:10.1117/12.537472

28 May 2004 Impact of resist blur on MEF, OPC, and CD control

Timothy A. Brunner, Carlos Fonseca, Nakgeuon Seong, Martin Burkhardt

Proceedings Volume 5377, Optical Microlithography XVII; (2004) https://doi.org/10.1117/12.537472
Event: Microlithography 2004, 2004, Santa Clara, California, United States

Abstract

This paper will consider the basic concepts of resist blur in a chemically amplified resist process, and the implications of this blur to lithography. In particular, use of a double Gaussian form for the resist blur will be explored. A simple lithographic model utilizing a double Gaussian resist blur was developed and applied to the rapid calculation of lithographic CDs. A typical gate patterning problem was modeled, both with and without assist features, using several different resist blur functions. The OPC treatment was found to be profoundly affected by the resist blur, especially the long-range component. The MEF of small pitch patterns was a sensitive indicator of the short-range blur. The rapid modeling capability allowed large Monte Carlo simulations to explore CD variation at different pitches, pointing out pitches that were particularly vulnerable to CD variation.

Citation Download Citation

Timothy A. Brunner, Carlos Fonseca, Nakgeuon Seong, and Martin Burkhardt "Impact of resist blur on MEF, OPC, and CD control", Proc. SPIE 5377, Optical Microlithography XVII, (28 May 2004); https://doi.org/10.1117/12.537472

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