New placement algorithm of contact layer patterns for NGL stencil complementary masks

Kokoro Kato; Kuninori Nishizawa; Tadao Inoue

doi:10.1117/12.557780

20 August 2004 New placement algorithm of contact layer patterns for NGL stencil complementary masks

Kokoro Kato, Kuninori Nishizawa, Tadao Inoue

Proceedings Volume 5446, Photomask and Next-Generation Lithography Mask Technology XI; (2004) https://doi.org/10.1117/12.557780
Event: Photomask and Next Generation Lithography Mask Technology XI, 2004, Yokohama, Japan

Abstract

The contact layer has been said to be the first application of NGL technologies such as EPL or LEEPL, in which stencil masks are used. Since the computation time depends on the number of edges of patterns, contact layer data which contains many rectangles takes very long time to process. Actually it has been reported that the complementary split of the contact layer patterns take longer time than any other layer like metal layer or poly line layer due to the numerous small rectangle patterns in the contact layer. This paper presents a new innovative algorithm, called gravity point method, to dispatch contact patterns very quickly onto complementary masks. The results show that the new gravity point method algorithm is effective for the huge size of contact layer data.

Citation Download Citation

Kokoro Kato, Kuninori Nishizawa, and Tadao Inoue "New placement algorithm of contact layer patterns for NGL stencil complementary masks", Proc. SPIE 5446, Photomask and Next-Generation Lithography Mask Technology XI, (20 August 2004); https://doi.org/10.1117/12.557780

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