Dr. Kokoro Kato Profile

Dr. Kokoro Kato

Project Manager/Sales Representative at Synopsys

SPIE Involvement:

Author | Editor

Publications (28)

Proceedings Article | 30 April 2023 Presentation

Verification methods for curvilinear and real-curve geometries

Kokoro Kato

Proceedings Volume 12495, 124950J (2023) https://doi.org/10.1117/12.2661609

KEYWORDS: Photomasks, Vestigial sideband modulation, Semiconductors, Semiconductor manufacturing, Optical proximity correction, Manufacturing, Lithography, Distance measurement, Data processing

Read Abstract +

Proceedings Article | 15 September 2022 Presentation

Verification methods for curvilinear and real-curve geometries

Kokoro Kato

Proceedings Volume PC12325, PC123250D (2022) https://doi.org/10.1117/12.2656142

Read Abstract +

Proceedings Article | 26 September 2019 Paper

Evaluation of neighborhood pattern matching algorithm in MPC processing

Kohei Yanagisawa, Kota Kobayashi, Kiyoshi Kageyama, Sebastian Munoz, Fabian Saso, Parikshit Kulkarni, John Valadez, Kokoro Kato

Proceedings Volume 11148, 111481K (2019) https://doi.org/10.1117/12.2538626

KEYWORDS: Process modeling, Manufacturing, Algorithm development, Software development, Photomasks, Optical proximity correction, Time metrology

Read Abstract +

Proceedings Article | 28 June 2013 Paper

Fuzzy pattern matching techniques for photomask layout data

Kokoro Kato, Yoshiyuki Taniguchi, Kuninori Nishizawa

Proceedings Volume 8701, 87010C (2013) https://doi.org/10.1117/12.2027851

KEYWORDS: Photomasks, Tolerancing, Optical proximity correction, Fuzzy logic, Data processing, Mirrors, Semiconducting wafers, Electronic design automation, Critical dimension metrology, Nanotechnology

Read Abstract +

Proceedings Article | 30 June 2012 Paper

Applications of MRC software for efficient mask manufacturing

Kokoro Kato, Yoshiyuki Taniguchi, Kuninori Nishizawa, Tadao Inoue

Proceedings Volume 8441, 84411D (2012) https://doi.org/10.1117/12.970256

KEYWORDS: Photomasks, Manufacturing, Extreme ultraviolet, Optical proximity correction, Software development, Mask making, Nanotechnology, Standards development, Semiconductors, Inspection

Read Abstract +

Proceedings Article | 30 June 2012 Paper

Novel MRC algorithms using GPGPU

Kokoro Kato, Yoshiyuki Taniguchi, Tadao Inoue, Kazuya Kadota

Proceedings Volume 8441, 84410R (2012) https://doi.org/10.1117/12.970255

KEYWORDS: Photomasks, Raster graphics, Software development, Data modeling, Computer architecture, Computer programming, Algorithm development, Visualization, Data processing, Computational lithography

Read Abstract +

Proceedings Article | 27 May 2010 Paper

Evaluation of mask manufacturing efficiency using mask data rank information

Kokoro Kato, Masakazu Endo, Tadao Inoue, Masaki Yamabe, Shigetoshi Nakatake

Proceedings Volume 7748, 77481N (2010) https://doi.org/10.1117/12.864084

KEYWORDS: Photomasks, Inspection, Analog electronics, Mirrors, Manufacturing, SRAF, Metals, Semiconductors, Defect inspection, Data conversion

Read Abstract +

Proceedings Article | 3 April 2010 Paper

Development of a design intent extraction flow for mask manufacturing

Kokoro Kato, Masakazu Endo, Tadao Inoue, Masaki Yamabe

Proceedings Volume 7641, 76410K (2010) https://doi.org/10.1117/12.846334

KEYWORDS: Photomasks, Inspection, Manufacturing, Semiconductors, Analog electronics, Defect inspection, Optical proximity correction, Electronic design automation, Design for manufacturability, Design for manufacturing

Read Abstract +

Proceedings Article | 23 September 2009 Paper

Mask data prioritization based on design intent - II

Masakazu Endo, Kokoro Kato, Tadao Inoue, Masaki Yamabe

Proceedings Volume 7488, 748824 (2009) https://doi.org/10.1117/12.829500

KEYWORDS: Photomasks, Inspection, Manufacturing, Data conversion, Design for manufacturing, Defect inspection, Data processing, Electronic design automation, Metals, Optical proximity correction

Read Abstract +

Proceedings Article | 23 September 2009 Paper

PMJ panel discussion overview: mask manufacturing with massive or multi-parallel method

Minoru Sugawara, Kokoro Kato

Proceedings Volume 7488, 748805 (2009) https://doi.org/10.1117/12.835786

KEYWORDS: Photomasks, Optical proximity correction, Inspection, Computational lithography, Double patterning technology, Lithography, Extreme ultraviolet, Extreme ultraviolet lithography, Source mask optimization, Data modeling

Read Abstract +

Proceedings Article | 11 May 2009 Paper

Utilization of design intent information for mask manufacturing (II)

Kokoro Kato, Masakazu Endo, Tadao Inoue, Masaki Yamabe

Proceedings Volume 7379, 737932 (2009) https://doi.org/10.1117/12.824352

KEYWORDS: Photomasks, Manufacturing, Inspection, Design for manufacturing, Analog electronics, Data conversion, Design for manufacturability, Semiconductors, Electronic design automation, Data processing

Read Abstract +

Proceedings Article | 17 October 2008 Paper

PMJ panel discussion overview on mask complexities, cost, and cycle time in 32-nm system LSI generation: conflict or concurrent?

Kunihiro Hosono, Kokoro Kato

Proceedings Volume 7122, 712207 (2008) https://doi.org/10.1117/12.803743

KEYWORDS: Photomasks, Inspection, Manufacturing, Design for manufacturing, Lithography, System on a chip, Optical proximity correction, Double patterning technology, Design for manufacturability, Semiconducting wafers

Read Abstract +

Proceedings Article | 17 October 2008 Paper

Mask data prioritization based on design intent

Kokoro Kato, Masakazu Endo, Tadao Inoue, Masaki Yamabe

Proceedings Volume 7122, 71223U (2008) https://doi.org/10.1117/12.801561

KEYWORDS: Photomasks, Inspection, Manufacturing, Semiconducting wafers, Data conversion, Design for manufacturing, Semiconductors, Design for manufacturability, Reticles, Data processing

Read Abstract +

Proceedings Article | 19 May 2008 Paper

An extraction of repeating patterns from OPCed layout data

Fujimoto Yoshihiro, Masahiro Shoji, Kokoro Kato, Tadao Inoue, Masaki Yamabe

Proceedings Volume 7028, 702836 (2008) https://doi.org/10.1117/12.793113

KEYWORDS: System on a chip, Optical proximity correction, Data conversion, Inspection, Metals, Manufacturing, Electronics, Vestigial sideband modulation, Parallel processing, Software development

Read Abstract +

Proceedings Article | 19 May 2008 Paper

Utilization of design intent information for mask manufacturing

Kokoro Kato, Masakazu Endo, Tadao Inoue, Masaki Yamabe

Proceedings Volume 7028, 702835 (2008) https://doi.org/10.1117/12.793112

KEYWORDS: Photomasks, Manufacturing, Inspection, Data conversion, Design for manufacturing, Design for manufacturability, Electronic filtering, Metals, Semiconductors, Databases

Read Abstract +

Proceedings Article | 19 May 2008 Paper

Comparison of verification methods for OASIS files: hierarchical or flat?

Kokoro Kato, Yoshiyuki Taniguchi, Masakazu Endo, Kuninori Nishizawa, Tadao Inoue, Toshiaki Fujii

Proceedings Volume 7028, 702834 (2008) https://doi.org/10.1117/12.793111

KEYWORDS: Photomasks, Data conversion, Optical proximity correction, Parallel processing, Nanotechnology, Data modeling, Standards development, Data processing, Error analysis, Explosives

Read Abstract +

Proceedings Article | 2 May 2008 Paper

Mask data rank (MDR) and its application

Kokoro Kato, Masakazu Endo, Tadao Inoue, Masaki Yamabe

Proceedings Volume 6792, 679209 (2008) https://doi.org/10.1117/12.798583

KEYWORDS: Photomasks, Manufacturing, Inspection, Design for manufacturing, Data conversion, Design for manufacturability, Electronic filtering, Semiconductors, Metals, Reticles

Read Abstract +

Proceedings Article | 12 March 2008 Paper

An extraction of repeating patterns from OPCed layout data

Yoshihiro Fujimoto, Masahiro Shoji, Kokoro Kato, Tadao Inoue, Masaki Yamabe

Proceedings Volume 6925, 69250Y (2008) https://doi.org/10.1117/12.771836

KEYWORDS: Optical proximity correction, Data conversion, Inspection, Vestigial sideband modulation, Manufacturing, Electronics, Parallel processing, Software development, Prototyping, Design for manufacturing

Read Abstract +

Proceedings Article | 1 November 2007 Paper

Mask rule check using priority information of mask patterns

Kokoro Kato, Yoshiyuki Taniguchi, Kuninori Nishizawa, Masakazu Endo, Tadao Inoue, Ryouji Hagiwara, Anto Yasaka

Proceedings Volume 6730, 67304F (2007) https://doi.org/10.1117/12.746549

KEYWORDS: Photomasks, Manufacturing, Inspection, Design for manufacturing, Data conversion, Software development, SRAF, Design for manufacturability, Optical proximity correction, Error analysis

Read Abstract +

Proceedings Article | 15 May 2007 Paper

Fast file size estimation of mask data conversion from OASIS to GDS2

Masakazu Endo, Yoshiyuki Taniguchi, Kuninori Nishizawa, Kokoro Kato

Proceedings Volume 6607, 66072P (2007) https://doi.org/10.1117/12.729008

KEYWORDS: Data conversion, Photomasks, Data analysis, Error analysis, Standards development, Electronic design automation, Nanotechnology, Data processing, Data compression

Read Abstract +

Proceedings Article | 20 May 2006 Paper

Advanced mask rule check (MRC) tool

Kokoro Kato, Kuninori Nishizawa, Tadao Inoue, Koki Kuriyama, Toshio Suzuki, Shogo Narukawa, Naoya Hayashi

Proceedings Volume 6283, 62830O (2006) https://doi.org/10.1117/12.681848

KEYWORDS: Photomasks, Data conversion, Manufacturing, Electronic design automation, Inspection, Nanotechnology, Data processing, Optical proximity correction, Resolution enhancement technologies, Printing

Read Abstract +

Proceedings Article | 20 May 2006 Paper

From GDSII to OASIS: practical support tools for data processing flow transition

Masakazu Endo, Kuninori Nishizawa, Kokoro Kato

Proceedings Volume 6283, 62832P (2006) https://doi.org/10.1117/12.681802

KEYWORDS: Data conversion, Data processing, Photomasks, Nanotechnology, Electronic design automation, Software development, Standards development, Optical proximity correction, Data compression, Vestigial sideband modulation

Read Abstract +

Proceedings Article | 28 June 2005 Paper

Effective IP protection method of mask data using OASIS format

Kuninori Nishizawa, Masakazu Endo, Kokoro Kato

Proceedings Volume 5853, (2005) https://doi.org/10.1117/12.617152

KEYWORDS: Parallel processing, Photomasks, Image compression, Process control, Local area networks, Intellectual property, Data storage, Algorithm development, Control systems, Image processing

Read Abstract +

Proceedings Article | 6 December 2004 Paper

IP protection of mask data by rebuilding the design hierarchy using OASIS format

Kokoro Kato, Kuninori Nishizawa, Tadao Inoue, Anto Yasaka

Proceedings Volume 5567, (2004) https://doi.org/10.1117/12.577807

KEYWORDS: Parallel processing, Data storage, Process control, Local area networks, Software development, Control systems, Nanotechnology, Photomask technology, Computing systems, Environmental sensing

Read Abstract +

Proceedings Article | 20 August 2004 Paper

Improvement of unified mask data formats for EB writers

Toshio Suzuki, Junji Hirumi, Nobuyuki Yoshioka, Yutaka Hojyo, Yuichi Kawase, Shigehiro Hara, Koki Kuriyama, Morihisa Hoga, Satoshi Watanabe, Hidemichi Kawase, Tomoko Kamimoto, Kokoro Kato

Proceedings Volume 5446, (2004) https://doi.org/10.1117/12.557738

KEYWORDS: Data conversion, Photomasks, Vestigial sideband modulation, Manufacturing, Data compression, Printing, Prototyping, Resolution enhancement technologies, Semiconductors, Nanotechnology

Read Abstract +

Proceedings Article | 20 August 2004 Paper

New placement algorithm of contact layer patterns for NGL stencil complementary masks

Kokoro Kato, Kuninori Nishizawa, Tadao Inoue

Proceedings Volume 5446, (2004) https://doi.org/10.1117/12.557780

KEYWORDS: Photomasks, Data conversion, Reticles, Image processing, Charged-particle lithography, Distance measurement, Metals, Parallel computing, Data processing, Manufacturing

Read Abstract +

Proceedings Article | 28 August 2003 Paper

EPL mask data conversion system EPLON

Kokoro Kato, Kuninori Nishizawa, Tamae Haruki, Tadao Inoue

Proceedings Volume 5130, (2003) https://doi.org/10.1117/12.504245

KEYWORDS: Data conversion, Photomasks, Parallel processing, Reticles, Electronic design automation, Local area networks, Data modeling, Electron beams, Optical lithography, Manufacturing

Read Abstract +

Proceedings Article | 1 August 2002 Paper

EPL data conversion system EPLON

Kokoro Kato, Kuninori Nishizawa, Tamae Haruki, Tadao Inoue

Proceedings Volume 4754, (2002) https://doi.org/10.1117/12.477010

KEYWORDS: Photomasks, Data conversion, Reticles, Data modeling, Semiconducting wafers, Optical lithography, Data processing, Lithography, Computer simulations, Charged-particle lithography

Read Abstract +