Metrologies for quantitative nanomechanical testing and quality control in semiconductor manufacturing

Jon R. Pratt; John A. Kramar; David B. Newell; Douglas T. Smith

doi:10.1117/12.607339

10 May 2005 Metrologies for quantitative nanomechanical testing and quality control in semiconductor manufacturing

Jon R. Pratt, John A. Kramar, David B. Newell, Douglas T. Smith

Proceedings Volume 5752, Metrology, Inspection, and Process Control for Microlithography XIX; (2005) https://doi.org/10.1117/12.607339
Event: Microlithography 2005, 2005, San Jose, California, United States

Abstract

If nanomechanical testing is to evolve into a tool for process and quality control in semiconductor fabrication, great advances in throughput, repeatability, and accuracy of the associated instruments and measurements will be required. A recent grant awarded by the NIST Advanced Technology Program seeks to address the throughput issue by developing a high-speed AFM-based platform for quantitative nanomechanical measurements. The following paper speaks to the issue of quantitative accuracy by presenting an overview of various standards and techniques under development at NIST and other national metrology institutes (NMIs) that can provide a metrological basis for nanomechanical testing. The infrastructure we describe places firm emphasis on traceability to the International System of Units, paving the way for truly quantitative, rather than qualitative, physical property testing.

Citation Download Citation

Jon R. Pratt, John A. Kramar, David B. Newell, and Douglas T. Smith "Metrologies for quantitative nanomechanical testing and quality control in semiconductor manufacturing", Proc. SPIE 5752, Metrology, Inspection, and Process Control for Microlithography XIX, (10 May 2005); https://doi.org/10.1117/12.607339

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