Comparative study of simulations and experiments for contact array patterns on attenuated phase shifting mask

Thomas Henkel; Martin Sczyrba; Christoph Noelscher

doi:10.1117/12.634349

5 November 2005 Comparative study of simulations and experiments for contact array patterns on attenuated phase shifting mask

Thomas Henkel, Martin Sczyrba, Christoph Noelscher

Author Affiliations +

Proceedings Volume 5992, 25th Annual BACUS Symposium on Photomask Technology; 59925G (2005) https://doi.org/10.1117/12.634349
Event: SPIE Photomask Technology, 2005, Monterey, California, United States

Abstract

Experiments and full resist simulations of contact patterns using both infinitely thin masks (2D) and 3-dimensional mask topography (3D) were performed to examine the quality of prediction by simulation. Experimental data were acquired by CD-SEM measurements of contact patterns in resist which were generated using a 193 nm scanner with a numerical aperture of 0.75, circular illumination (σ=0.5), and an attenuated phase shifting mask with 6% transmission. Analysis of the data is performed in terms of dose to size, process window, mask error enhancement factor (MEEF), and printed critical dimension (CD) in resist. Furthermore, an error analysis is performed with respect to mask CD, illumination source, dose and focus error. For the same contact size in resist a parabola like dependence of the mask contact length on contact width was found by experiment and simulation. Fair agreement between 2D and 3D simulation was obtained above 180 nm mask CD whereas a strong difference was observed below this region. Especially the location of the minimum at around 140 nm mask CD can be reasonably described only by 3D simulation. Thus, the prediction of accurate mask biases and process windows in the lower mask CD region is only possible by 3D simulation. Simple corrections of the 3D effect like the consideration of a mask CD offset or dose offset fail. Apart from that, 2D simulation in conjunction with a well calibrated resist model is sufficient for delivering reliable predictions for process window, MEEF, and CD.

Citation Download Citation

Thomas Henkel, Martin Sczyrba, and Christoph Noelscher "Comparative study of simulations and experiments for contact array patterns on attenuated phase shifting mask", Proc. SPIE 5992, 25th Annual BACUS Symposium on Photomask Technology, 59925G (5 November 2005); https://doi.org/10.1117/12.634349

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available

Members: $17.00

Non-members: $21.00 ADD TO CART

PROCEEDINGS
9 PAGES

DOWNLOAD PAPER SAVE TO MY LIBRARY

GET CITATION

RIGHTS & PERMISSIONS

Get copyright permission Get copyright permission on Copyright Marketplace

KEYWORDS

Photomasks

Critical dimension metrology

3D modeling

Error analysis

Calibration

3D acquisition

Phase shifting

Show All Keywords

Keywords/Phrases

Search In:

Publication Years