Macro analysis of line edge and line width roughness

Jangho Shin; Jinyoung Yoon; Youngjae Jung; SukJoo Lee; Sang-Gyun Woo; Han-Ku Cho; Joo-Tae Moon

doi:10.1117/12.655516

24 March 2006 Macro analysis of line edge and line width roughness

Jangho Shin, Jinyoung Yoon, Youngjae Jung, SukJoo Lee, Sang-Gyun Woo, Han-Ku Cho, Joo-Tae Moon

Proceedings Volume 6152, Metrology, Inspection, and Process Control for Microlithography XX; 61520X (2006) https://doi.org/10.1117/12.655516
Event: SPIE 31st International Symposium on Advanced Lithography, 2006, San Jose, California, United States

Abstract

Line edge and line width roughness (LER/LWR) is commonly estimated by standard deviation sigma. Since the standard deviation is a function of sample line length L, the behavior of sigma(L) curve is characterized by the correlation length and roughness exponent. In this paper, an efficient and practical macro LER/LWR analysis is implemented by characterizing an arbitrary array of similar features within a single CD-SEM image. A large amount of statistical data is saved from a single scan image. As a result, it reports full LER/LWR information including correlation length, roughness exponent, sigma at infinite line length, and power spectrum. Off-line, in-house software is developed for automated investigation, and it is successfully evaluated against various patterns. Starting with the detailed description of the algorithm, experimental results are discussed.

Citation Download Citation

Jangho Shin, Jinyoung Yoon, Youngjae Jung, SukJoo Lee, Sang-Gyun Woo, Han-Ku Cho, and Joo-Tae Moon "Macro analysis of line edge and line width roughness", Proc. SPIE 6152, Metrology, Inspection, and Process Control for Microlithography XX, 61520X (24 March 2006); https://doi.org/10.1117/12.655516

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