Dr. Han-Ku Cho Profile

Dr. Han-Ku Cho

Director at ASML Korea Co Ltd

SPIE Involvement:

Author

Publications (149)

Proceedings Article | 20 September 2013 Paper

Study of ion beam damage in magnetic tunnel junction on FIB prepared samples

Kwangho Park, Cheolwoong Yang, Kyuchul Kim, Dongwoo Nam, Kyuman Hwang, Junsoo Bae, Juhyeon Ahn, Jin Choi, Soonoh Park, Sangsup Jeong, Hanku Cho, Eunseung Jeong

Proceedings Volume 8819, 88190I (2013) https://doi.org/10.1117/12.2026767

KEYWORDS: Oxides, Ferromagnetics, Ions, Silicon, Resistance, Magnetism, Transmission electron microscopy, Ion beams, Semiconducting wafers, Gallium

Read Abstract +

Proceedings Article | 9 September 2013 Paper

Mask automation: need a revolution in mask makers and equipment industry

Young-hwa Noh, Hyun-Joo Lee, Han-Ku Cho, Seong-yong Moon, Ki-jung Son, Sang-yong Yu

Proceedings Volume 8880, 888016 (2013) https://doi.org/10.1117/12.2025569

KEYWORDS: Semiconductors, Manufacturing, Control systems, Telecommunications, Process control, Photomasks, Extreme ultraviolet, Mask making, Semiconducting wafers, Wafer manufacturing

Read Abstract +

Proceedings Article | 8 November 2012 Paper

Study for compensation of unexpected image placement error caused by VSB mask writer deflector

Jonggul Doh, Jinho Ahn, Seong-yong Moon, Han-Ku Cho, Min-kyu Choi, Hyun-joo Lee

Proceedings Volume 8522, 852228 (2012) https://doi.org/10.1117/12.964098

KEYWORDS: Semiconductors, Electron beams, Contamination, Data modeling, Calibration, Reliability, Photomasks, Associative arrays, Beam shaping, Vestigial sideband modulation

Read Abstract +

Proceedings Article | 14 October 2011 Paper

EUVL mask inspection using 193nm wavelength for 30nm node and beyond

In-Yong Kang, Byungcheol Cha, Han-Ku Cho, Inkyun Shin, Wonil Cho, Tae-Geun Kim, Jihoon Na

Proceedings Volume 8166, 81661H (2011) https://doi.org/10.1117/12.898896

KEYWORDS: Wafer-level optics, Defect detection, Modulation, Scanners, Inspection, Reflectivity, Scanning electron microscopy, Photomasks, Extreme ultraviolet lithography, Semiconducting wafers

Read Abstract +

Proceedings Article | 14 October 2011 Paper

The requirements for the future e-beam mask writer: statistical analysis of pattern accuracy

Sang Hee Lee, Jin Choi, Han-Ku Cho, Hee Bom Kim, Byung Gook Kim

Proceedings Volume 8166, 81661B (2011) https://doi.org/10.1117/12.896977

KEYWORDS: Electron beam lithography, Calibration, Error analysis, Inspection, Image registration, Photomasks, Mask making, Critical dimension metrology, Line edge roughness, Vestigial sideband modulation

Read Abstract +

Proceedings Article | 14 October 2011 Paper

Pattern placement error due to resist charging effect at 50kV e-beam writer: mechanism and its correction

Han Ku Cho, Suk Jong Bae, B. G. Kim, Jin Choi, Hee Bom Kim

Proceedings Volume 8166, 81661Z (2011) https://doi.org/10.1117/12.898856

KEYWORDS: Lithography, Electron beam lithography, Scattering, Monte Carlo methods, Photomasks, Extreme ultraviolet, Double patterning technology, Critical dimension metrology, Semiconducting wafers, Astatine

Read Abstract +

Proceedings Article | 8 April 2011 Paper

Availability of underlayer application to EUV process

Hitoshi Kosugi, Cha-Won Koh, Hai-Sub Na, Hiroshi Marumoto, Chang-Min Park, Kyoungyong Cho, Carlos Fonseca, Cheol-Hong Park, Fumiko Iwao, Hyun-Woo Kim, Hanku Cho

Proceedings Volume 7969, 79692E (2011) https://doi.org/10.1117/12.878730

KEYWORDS: Thin films, Contamination, Data modeling, Calibration, Etching, Coating, Scanning electron microscopy, Extreme ultraviolet, Extreme ultraviolet lithography, Semiconducting wafers

Read Abstract +

Proceedings Article | 7 April 2011 Paper

CD uniformity improvement for EUV resists process: EUV resolution enhancement layer

Sumin Kim, Han-Ku Cho, Chawon Koh, Hyun-Woo Kim, Hai-Sub Na, In-Sung Kim, Cheolhong Park, Chang-Min Park

Proceedings Volume 7969, 796916 (2011) https://doi.org/10.1117/12.879791

KEYWORDS: Deep ultraviolet, Reflectivity, Photomasks, Extreme ultraviolet, Line width roughness, Extreme ultraviolet lithography, Critical dimension metrology, Photoresist processing, Resolution enhancement technologies, Plasma

Read Abstract +

Proceedings Article | 2 April 2011 Paper

Current status of EUV mask inspection using 193nm optical inspection system in 30nm node and beyond

Wonil Cho, Chan-Uk Jeon, Jihoon Na, Eun Young Park, Anoop Sreenath, HanKu Cho, Shmoolik Mangan, Sang Hoon Han, Dana Bernstein, Dong Hoon Chung

Proceedings Volume 7985, 79850V (2011) https://doi.org/10.1117/12.895209

KEYWORDS: Signal to noise ratio, Lithography, Scanners, Manufacturing, Inspection, Optical inspection, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Semiconducting wafers

Read Abstract +

Proceedings Article | 26 March 2011 Paper

Printability and inspectability of defects on the EUV mask for sub-32nm half pitch HVM application

Han-Ku Cho, Jooon Park, Sang-Hyun Kim, Dongwan Kim, Seong-Sue Kim, Gregg Inderhees, Hwan-seok Seo, Iacopo Mochi, Sungmin Huh, In-Yong Kang, Tsutomu Shoki, Kenneth Goldberg

Proceedings Volume 7969, 796902 (2011) https://doi.org/10.1117/12.879384

KEYWORDS: Defect detection, Particles, Manufacturing, Inspection, Wafer inspection, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Semiconducting wafers, Defect inspection

Read Abstract +

Proceedings Article | 25 September 2010 Paper

An analysis of correlation between scanning direction and defect detection at ultra high resolution

Chan-Uk Jeon, HanKu Cho, SungPil Choi, Kwon Lim, Wonil Cho, Dong Hoon Chung

Proceedings Volume 7823, 782334 (2010) https://doi.org/10.1117/12.866017

KEYWORDS: Defect detection, Sensors, Image processing, Inspection, Image quality, Image sensors, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Semiconducting wafers

Read Abstract +

Proceedings Article | 25 September 2010 Paper

Plasma monitoring of chrome dry etching for mask making

Han-Ku Cho, Dong-Chan Kim, Sang-Gyun Woo, Dong-Seok Nam, Sung-Won Kwon

Proceedings Volume 7823, 78230F (2010) https://doi.org/10.1117/12.866828

KEYWORDS: Etching, Dry etching, Chromium, Oxygen, Emission spectroscopy, Photomasks, Plasma etching, Mask making, Chlorine, Plasma

Read Abstract +

Proceedings Article | 25 September 2010 Paper

Damage/organic free ozonated DI water cleaning on EUVL Ru capping layer

Chan-uk Jeon, Jin-Goo Park, Bong-kyun Kang, Seung-ho Lee, Han-ku Cho, Hyuk-min Kim, Han-shin Lee, Hyung-ho Ko, Jin-ho Ahn, Min-soo Kim

Proceedings Volume 7823, 78232Z (2010) https://doi.org/10.1117/12.878895

KEYWORDS: Carbon, Lithography, Carbon dioxide, Gases, Atomic force microscopy, Oxygen, Extreme ultraviolet lithography, Scanning probe microscopy, Ozone, Ruthenium

Read Abstract +

Proceedings Article | 25 September 2010 Paper

Degradation of pattern quality due to strong electron scattering in EUV mask

Sang Hee Lee, Byung Sup Ahn, Han Ku Cho, Jin Choi, Rae Won Lee, Sang-Gyun Woo, Hee Bom Kim

Proceedings Volume 7823, 78230D (2010) https://doi.org/10.1117/12.864212

KEYWORDS: Electron beam lithography, Scattering, Metals, Laser scattering, Monte Carlo methods, Ion beams, Ray tracing, Photomasks, Extreme ultraviolet, Molybdenum

Read Abstract +

Proceedings Article | 27 May 2010 Paper

The optical CD metrology for EUV mask

Jin-Back Park, Han-Ku Cho, Kyoung-Yoon Bang, Dong-Gun Lee, Seung-Soo Kim, Hae-Young Jeong

Proceedings Volume 7748, 77481X (2010) https://doi.org/10.1117/12.868293

KEYWORDS: Data modeling, Etching, Silicon, Atomic force microscopy, Scanning electron microscopy, Photomasks, Extreme ultraviolet, Critical dimension metrology, Ruthenium, EUV optics

Read Abstract +

Proceedings Article | 27 May 2010 Paper

Requirements of e-beam size and position accuracy for photomask of sub-32 nm HP device

Byung Gook Kim, Sang Hee Lee, Hee Bom Kim, Jin Choi, Han Ku Cho, Sang-Gyun Woo

Proceedings Volume 7748, 774819 (2010) https://doi.org/10.1117/12.868174

KEYWORDS: Lithography, Electron beam lithography, Electron beams, Photomasks, Extreme ultraviolet lithography, Computational lithography, Optical proximity correction, Critical dimension metrology, Line edge roughness, Vestigial sideband modulation

Read Abstract +

Proceedings Article | 26 May 2010 Paper

Effect of EUV exposure upon surface residual chemicals on EUV mask surface

DonGun Lee, Han-Shin Lee, Jaehyuck Choi, HanKu Cho, SeongSu Kim, Chan-Uk Jeon, Hyungho Ko

Proceedings Volume 7748, 774804 (2010) https://doi.org/10.1117/12.868292

KEYWORDS: Carbon, Optical lithography, Contamination, Air contamination, Ions, Reflectivity, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Ruthenium

Read Abstract +

Proceedings Article | 26 May 2010 Paper

Mask writing time explosion and its effect on CD control in e-beam lithography

Han-Ku Cho, Jin Choi, Seong Jun Min, Byung Gook Kim, Sang Hee Lee, Hee Bom Kim, Sang-Gyun Woo

Proceedings Volume 7748, 77480J (2010) https://doi.org/10.1117/12.868264

KEYWORDS: Lithography, Electron beam lithography, Error analysis, Photomasks, Optical simulations, Optical proximity correction, Mask making, Error control coding, Vestigial sideband modulation, Beam controllers

Read Abstract +

Proceedings Article | 26 May 2010 Paper

E-beam writing time improvement for inverse lithography technology mask for full-chip

Tom Cecil, Dong Hwan Son, Sung Soo Suh, Dave Irby, Byung-Gook Kim, David Kim, SungGon Jung, Guangming Xiao, HanKu Cho, Ki-Ho Baik

Proceedings Volume 7748, 77481T (2010) https://doi.org/10.1117/12.867995

KEYWORDS: Lithography, Electron beam lithography, Image segmentation, Manufacturing, Control systems, Photomasks, SRAF, Critical dimension metrology, Stereolithography, Resolution enhancement technologies

Read Abstract +

Proceedings Article | 23 March 2010 Paper

Influence of mask surface roughness on 22nm node extreme ultraviolet lithography

Ilsin An, Eun-Jin Kim, Seoung-Sue Kim, Han-Ku Cho, Hye-Keun Oh, Jinho Ahn, Jee-Hye You

Proceedings Volume 7636, 76362K (2010) https://doi.org/10.1117/12.846895

KEYWORDS: Carbon, Optical lithography, Contamination, Image processing, Reflectivity, Surface roughness, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Ruthenium

Read Abstract +

Proceedings Article | 20 March 2010 Paper

Printability and inspectability of programmed pit defects on the masks in EUV lithography

Byung-Sup Ahn, Kenneth Goldberg, Iacopo Mochi, Dong-Gun Lee, Hwan-Seok Seo, Brian Cha, Dongwan Kim, Han-Ku Cho, In-Yong Kang, Seoung-Sue Kim, Cha-Won Koh, Sungmin Huh

Proceedings Volume 7636, 76361B (2010) https://doi.org/10.1117/12.847956

KEYWORDS: Inspection, Atomic force microscopy, Ion beams, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Critical dimension metrology, Semiconducting wafers, Visibility, Defect inspection

Read Abstract +

Proceedings Article | 20 March 2010 Paper

Absorber stack optimization in EUVL masks: lithographic performances in alpha demo tool and other issues

In-Yong Kang, Dongwan Kim, Byung-Sup Ahn, Hwan-Seok Seo, Cha-Won Koh, Tae Geun Kim, Seong-Sue Kim, Han-Ku Cho, Hoon Kim, Dong-Gun Lee

Proceedings Volume 7636, 76360X (2010) https://doi.org/10.1117/12.847955

KEYWORDS: Lithography, Scanners, Inspection, Electroluminescence, Photomasks, Extreme ultraviolet, Line width roughness, Extreme ultraviolet lithography, Critical dimension metrology, Semiconducting wafers

Read Abstract +

Proceedings Article | 20 March 2010 Paper

Patterning with EUVL: the road to 22nm node

Chang-Min Park, Takahiro Yasue, Subramanya Mayya, Kyoung-Yong Cho, Hai-Sub Na, Han-Ku Cho, Hyun-Woo Kim

Proceedings Volume 7636, 76360Q (2010) https://doi.org/10.1117/12.846474

KEYWORDS: Lithography, Deep ultraviolet, Opacity, Polymers, Photomasks, Extreme ultraviolet, Line width roughness, Extreme ultraviolet lithography, Double patterning technology, Chemical reactions

Read Abstract +

Proceedings Article | 11 December 2009 Paper

Development and evaluation of new MRC parameter for aggressive mask optimization

Han-ku Cho, Hee-bom Kim, Seong-hoon Jang, Seong-bo Shim, Sung-woo Lee, Young-chang Kim, Chan-hoon Park, Seong-woon Choi

Proceedings Volume 7520, 75200U (2009) https://doi.org/10.1117/12.839398

KEYWORDS: Manufacturing, Inspection, Scanning electron microscopy, Image quality, Photomasks, Source mask optimization, SRAF, Critical dimension metrology, Tolerancing, Defect inspection

Read Abstract +

Proceedings Article | 30 September 2009 Paper

Inverse lithography (ILT) mask manufacturability for full-chip device

Dave Irby, Sung Soo Suh, Byung-Gook Kim, Ki-Ho Baik, Dong Hwan Son, David Kim, Sang Gyun Woo, HanKu Cho, Guangming Xiao

Proceedings Volume 7488, 748812 (2009) https://doi.org/10.1117/12.833572

KEYWORDS: Lithography, Image segmentation, Error analysis, Manufacturing, Inspection, Scanning electron microscopy, Photomasks, Optical proximity correction, SRAF, Resolution enhancement technologies

Read Abstract +

Proceedings Article | 23 September 2009 Paper

Aerial plane inspection for advanced photomask defect detection

Aditya Dayal, Won Sun Kim, Han Ku Cho, Dong Hoon Chung, Chan Uk Jeon, Oscar Lee, William Huang, Jin Hyung Park, Trent Hutchinson

Proceedings Volume 7488, 74882Q (2009) https://doi.org/10.1117/12.830139

KEYWORDS: Lithography, Reticles, Defect detection, Image processing, Inspection, Image resolution, Wafer inspection, Photomasks, SRAF, Semiconducting wafers

Read Abstract +

Proceedings Article | 23 September 2009 Paper

Inspection of complex OPC patterns for 4x node and beyond

Sang Hoon Han, Dong Hoon Chung, Chan-Uk Jeon, HanKu Cho, Won-Sun Kim, Wonil Cho

Proceedings Volume 7488, 74882S (2009) https://doi.org/10.1117/12.830032

KEYWORDS: Reticles, Defect detection, Inspection, Image resolution, Photomasks, Artificial intelligence, Optical proximity correction, SRAF, Semiconducting wafers, Model-based design

Read Abstract +

Proceedings Article | 23 September 2009 Paper

Mask pattern recovery by level set method based inverse inspection technology (IIT) and its application on defect auto disposition

KiHo Baik, Linyong Pang, Han Ku Cho, Chan-Uk Jeon, David Kim, Danping Peng, Tom Cecil, Vikram Tolani, Paul D. H. Chung, Jin-Hyung Park

Proceedings Volume 7488, 748809 (2009) https://doi.org/10.1117/12.830034

KEYWORDS: Wafer-level optics, Lithography, Defect detection, Inspection, Scanning electron microscopy, Photomasks, Image classification, SRAF, Semiconducting wafers, Defect inspection

Read Abstract +

Proceedings Article | 9 June 2009 Paper

Trade-off between inverse lithography mask complexity and lithographic performance

Sung Soo Suh, Ki-Ho Baik, Grace Dai, Byung-Gook Kim, Bob Gleason, Guangming Xiao, Kechang Wang, Byung-Sung Kim, Han-Ku Cho, Sang-Gyun Woo, David Kim, Vikram Tolani, Dave Irby

Proceedings Volume 7379, 73791M (2009) https://doi.org/10.1117/12.824299

KEYWORDS: Lithography, Logic, Image processing, Manufacturing, Inspection, Scanning electron microscopy, Photomasks, Optical proximity correction, Systems modeling, Model-based design

Read Abstract +

Proceedings Article | 11 May 2009 Paper

The novel plasma etching process for defect reduction in photomask fabrication

Byounghoon Seung, Il-Yong Jang, Sang-Gyun Woo, Yu Suk Jeong, Ji-Hyun Lee, Seong-Yong Moon, Han Ku Cho

Proceedings Volume 7379, 737906 (2009) https://doi.org/10.1117/12.824247

KEYWORDS: Etching, Particles, Dielectrics, Chromium, Photomasks, Aluminum, Plasma etching, Chlorine, Fluorine, Plasma

Read Abstract +

Proceedings Article | 11 May 2009 Paper

A new optical measurement method for verifying the exact change of thin films on the QZ blanks with ellipsometer

Songbae Moon, Han-ku Cho, Sang-Gyun Woo, Seong-Yoon Kim, Gyung-Yoon Bang, Byung-Gook Kim

Proceedings Volume 7379, 737913 (2009) https://doi.org/10.1117/12.824315

KEYWORDS: Oxides, Thin films, Ellipsometry, Chromium, Atomic force microscopy, Optical testing, Transmittance, Photomasks, Photoresist processing, Binary data

Read Abstract +

Proceedings Article | 11 May 2009 Paper

E-beam shot count estimation at 32 nm HP and beyond

Sang Hee Lee, Dongseok Nam, Jin Choi, Sang-Gyun Woo, Byung Gook Kim, Han Ku Cho

Proceedings Volume 7379, 737917 (2009) https://doi.org/10.1117/12.824284

KEYWORDS: Lithography, Electron beam lithography, Image processing, Photomasks, Optical proximity correction, Critical dimension metrology, Line edge roughness, Semiconducting wafers, Vestigial sideband modulation, Edge roughness

Read Abstract +

Proceedings Article | 1 April 2009 Paper

Line edge and width roughness dependency on each ingredient of extreme ultraviolet molecular resist

Han-Ku Cho, Hye-Keun Oh, Seong-Sue Kim, Hyunsu Kim, In Wook Cho

Proceedings Volume 7273, 72732E (2009) https://doi.org/10.1117/12.814055

KEYWORDS: Lithography, Polymers, Image processing, Molecules, Diffusion, Monte Carlo methods, Extreme ultraviolet, Line width roughness, Extreme ultraviolet lithography, Line edge roughness

Read Abstract +

Proceedings Article | 1 April 2009 Paper

Reduction of line width and edge roughness by resist reflow process for extreme ultra-violet lithography

Seong-Sue Kim, Joon-Min Park, Han-Ku Cho, Hye-Keun Oh, Hyunsu Kim, Joo-Yoo Hong, In Wook Cho

Proceedings Volume 7273, 72732D (2009) https://doi.org/10.1117/12.814108

KEYWORDS: Lithography, Polymers, Glasses, Diffusion, Surface roughness, Monte Carlo methods, Line width roughness, Extreme ultraviolet lithography, Line edge roughness, Photoresist processing

Read Abstract +

Proceedings Article | 23 March 2009 Paper

Requirements of the inspection for double patterning technology reticles

Sunpyo Lee, Jihyeon Choi, Yonghoon Kim, Won-Sun Kim, HanKu Cho, Wonil Cho, Sung-Joon Sohn

Proceedings Volume 7272, 72721T (2009) https://doi.org/10.1117/12.814101

KEYWORDS: Reticles, Radon, Defect detection, Inspection, Photomasks, Double patterning technology, Ear, Critical dimension metrology, Semiconducting wafers, Defect inspection

Read Abstract +

Proceedings Article | 18 March 2009 Paper

Incident angle change caused by different off-axis illumination in extreme ultraviolet lithography

Han-Ku Cho, Eun-Jin Kim, Hye-Keun Oh, Jee-Hye You, Seong-Sue Kim, Ilsin An

Proceedings Volume 7271, 727143 (2009) https://doi.org/10.1117/12.814031

KEYWORDS: Lithography, Optical lithography, Lithographic illumination, Coherence (optics), Reflectivity, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Critical dimension metrology, Resolution enhancement technologies

Read Abstract +

Proceedings Article | 18 March 2009 Paper

Characteristics and issues of an EUVL mask applying phase-shifting thinner absorber for device fabrication

Dong-Gun Lee, Seong-Sue Kim, In-Yong Kang, Sungmin Huh, Dongwan Kim, Han-Ku Cho, Hoon Kim, Hakseung Han, Byung-Sup Ahn, Hwan-Seok Seo

Proceedings Volume 7271, 72710D (2009) https://doi.org/10.1117/12.813932

KEYWORDS: Refractive index, Silicon, Reflectivity, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Nanoimprint lithography, Semiconducting wafers, Ruthenium, Phase shifts

Read Abstract +

Proceedings Article | 20 October 2008 Paper

A new paradigm for haze improvement: retardation of haze occurrence by creating mask substrate insensitive to chemical contamination level

Han-Shin Lee, Jaehyuck Choi, Sang-Gyun Woo, Hae-Young Jeong, HanKu Cho, Soo-Jung Kang, Jin-Sik Jung, Jong-Keun Oh

Proceedings Volume 7122, 712217 (2008) https://doi.org/10.1117/12.801422

KEYWORDS: Contamination, Air contamination, Molecules, Ions, Sulfur, Resistance, Surface roughness, Transmittance, Photomasks, Chemical analysis

Read Abstract +

Proceedings Article | 17 October 2008 Paper

Mask process monitoring with optical CD measurements for sub-50-nm

Dong-Hoon Chung, Sang-Gyun Woo, Jin-Back Park, Kyung-Yoon Bang, Jeong-Hun Roh, Han-Ku Cho, Sung-Yong Cho, Yong-Hoon Kim

Proceedings Volume 7122, 71222V (2008) https://doi.org/10.1117/12.801416

KEYWORDS: Ultraviolet radiation, Chromium, Atomic force microscopy, Optical testing, Scanning electron microscopy, Scatterometry, Process control, Critical dimension metrology, Scatter measurement, Binary data

Read Abstract +

Proceedings Article | 17 October 2008 Paper

Analysis of process margin in EUV mask repair with nano-machining

Sang-Hyeon Lee, Hong-Seok Sim, Jung-Hwan Lee, Ron Bozak, Seong-Sue Kim, Geun-Bae Kim, Seong-Yong Moon, Sang-Gyun Woo, HanKu Cho, Andrew Dinsdale, Hwa-Sung Kim, David Lee, Hwan-Seok Seo, Su-Young Lee, Tod Robinson, Hak-Seung Han

Proceedings Volume 7122, 71222I (2008) https://doi.org/10.1117/12.801415

KEYWORDS: Diffractive optical elements, Image processing, Error analysis, Scanning electron microscopy, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Critical dimension metrology, Semiconducting wafers, Factor analysis

Read Abstract +

Proceedings Article | 17 October 2008 Paper

Control of the sidewall angle of an absorber stack using the Faraday cage system for the change of pattern printability in EUVL

Sung-Min Huh, Jin-Kwan Lee, Seong-Yong Moon, Sang Heup Moon, Il-Yong Jang, HanKu Cho, Sang-Gyun Woo

Proceedings Volume 7122, 712228 (2008) https://doi.org/10.1117/12.801413

KEYWORDS: Oxides, Optical properties, Etching, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Critical dimension metrology, Tantalum, Semiconducting wafers, Plasma

Read Abstract +

Proceedings Article | 19 May 2008 Paper

Distributed processing (DP) based e-beam lithography simulation with long range correction algorithm in e-beam machine

Won-Tai Ki, Byung-Gook Kim, Han-Ku Cho, Sang-Gyun Woo, Ji-Hyeon Choi

Proceedings Volume 7028, 70280E (2008) https://doi.org/10.1117/12.793022

KEYWORDS: Electron beam lithography, Dry etching, Computer simulations, Monte Carlo methods, Photomasks, Cadmium sulfide, Double patterning technology, Convolution, Forward error correction, Vestigial sideband modulation

Read Abstract +

Proceedings Article | 19 May 2008 Paper

Prevention of chemical residue from growing into Haze defect on PSM pattern edge after normal cleaning process

Han-shin Lee, Jaehyuck Choi, Jongkeun Oh, Jin-sik Jung, Soojung Kang, Yonghoon Kim, Haeyong Jeong, HanKu Cho

Proceedings Volume 7028, 702818 (2008) https://doi.org/10.1117/12.793049

KEYWORDS: Oxides, Silica, Air contamination, Ions, Sulfur, Profiling, Photomasks, Scanning probe microscopy, Information operations, Industrial chemicals

Read Abstract +

Proceedings Article | 19 May 2008 Paper

Practical application of aerial imaging mask inspection for memory devices

Han Ku Cho, Dong Hoon Chung, Eun Young Park, Shmoolik Mangan, Amir Sagiv, Yaniv Brami, Yong Hoon Kim, Hyun Joo Baik, Dana Bernstein, Ziv Parizat

Proceedings Volume 7028, 70281G (2008) https://doi.org/10.1117/12.793057

KEYWORDS: Optical lithography, Defect detection, Sensors, Inspection, Printing, Photomasks, Critical dimension metrology, Semiconducting wafers, Signal detection, Airborne remote sensing

Read Abstract +

Proceedings Article | 19 May 2008 Paper

IntenCD: an application for CD uniformity mapping of photomask and process control at maskshops

HanKu Cho, Lior Shoval, Byunggook Kim, Heebom Kim, MyoungSoo Lee, Christophe Couderc, Young-Su Sung, Sukho Lee, Sang-Gyun Woo, Michael Ben Yishai

Proceedings Volume 7028, 70281K (2008) https://doi.org/10.1117/12.793061

KEYWORDS: Lithography, Imaging systems, Inspection, Scanning electron microscopy, Process control, Photomasks, Critical dimension metrology, Semiconducting wafers, Airborne remote sensing, Defect inspection

Read Abstract +

Proceedings Article | 19 May 2008 Paper

Image placement error of photomask due to pattern loading effect: analysis and correction technique for sub-45 nm node

Dongseok Nam, Sang-Gyun Woo, Sang Hee Lee, Han Ku Cho, Byung Gook Kim, Jin Choi

Proceedings Volume 7028, 70281X (2008) https://doi.org/10.1117/12.793074

KEYWORDS: Lithography, Electron beam lithography, Etching, Image processing, Error analysis, Electrons, Image registration, Finite element methods, Photomasks, Critical dimension metrology

Read Abstract +

Proceedings Article | 27 March 2008 Paper

Lifetime of EUVL masks as a function of degree of carbon contamination and capping materials

Dong Gun Lee, Seoung Sue Kim, Hwan-Seok Seo, Jaehyuck Choi, Byungsup Ahn, Takeo Watanabe, Gisung Yoon, Hoon Kim, Hiroo Kinoshita, Han Ku Cho, Han-Shin Lee, Sungmin Huh, Dongwan Kim

Proceedings Volume 6921, 692115 (2008) https://doi.org/10.1117/12.772412

KEYWORDS: Carbon, Contamination, Silicon, Reflectivity, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Critical dimension metrology, Semiconducting wafers, Ruthenium

Read Abstract +

Proceedings Article | 7 March 2008 Paper

Rigorous modeling and analysis of impact produced by microstructures in mask on wafer pattern fidelity

HeeBom Kim, MyoungSoo Lee, HanKu Cho, Irina Pundaleva, ByungGook Kim, Roman Chalykh

Proceedings Volume 6924, 69244H (2008) https://doi.org/10.1117/12.773203

KEYWORDS: Diffraction, Refractive index, Femtosecond phenomena, Quartz, Distortion, Transmittance, Photomasks, Semiconducting wafers, Pulsed laser operation, Binary data

Read Abstract +

Proceedings Article | 4 March 2008 Paper

Predicting conversion time of circuit design file by artificial neural networks

Ji-Hyeon Choi, Sung-Hoon Jang, Sang-Gyun Woo, Won-Tai Ki, Jee-Hyong Lee, Han-Ku Cho, Byoung-Sup Ahn

Proceedings Volume 6925, 69250W (2008) https://doi.org/10.1117/12.771771

KEYWORDS: Statistical analysis, Data modeling, Error analysis, Neural networks, Photomasks, Artificial intelligence, Explosives, Data conversion, Statistical modeling, Neurons

Read Abstract +

Proceedings Article | 14 November 2007 Paper

Full-chip-based subresolution assist features correction for mask manufacturing

Sang-Gyun Woo, Isao Aburatani, Han-Ku Cho, Issei Masumoto, Sung-Hoon Jang, Ju-Mi Bang, Min-Kyu Ji, Ji-Hyun Choi

Proceedings Volume 6730, 67302F (2007) https://doi.org/10.1117/12.746349

KEYWORDS: Semiconductors, Lithography, Manufacturing, Inspection, Control systems, Printing, Photomasks, SRAF, Mask making, Critical dimension metrology

Read Abstract +

Proceedings Article | 30 October 2007 Paper

Requirements of photomask registration for the 45nm node and beyond: Is it possible?

Jin Choi, Hae Young Jeong, Jeung Woo Lee, Byung Gook Kim, Sang Hee Lee, Hee Bom Kim, Sang-Gyun Woo, Dong Hun Lee, Han Ku Cho

Proceedings Volume 6730, 67301O (2007) https://doi.org/10.1117/12.746571

KEYWORDS: Electron beam lithography, Optical lithography, Etching, Error analysis, Distortion, Image registration, Pellicles, Finite element methods, Photomasks, Positioning equipment

Read Abstract +

Proceedings Article | 30 October 2007 Paper

2D measurement using CD SEM for arbitrarily shaped patterns

TaeJun Kim, Hyung-Joo Lee, Takayuki Nakamura, HanKu Cho, Jun Matsumoto, Dong-Hoon Chung, So-Yoon Bae, Sang-Gyun Woo, Dong Il Shin

Proceedings Volume 6730, 673037 (2007) https://doi.org/10.1117/12.746453

KEYWORDS: Semiconductors, Lithography, Edge detection, Detection and tracking algorithms, Scanning electron microscopy, Optical metrology, Photomasks, Critical dimension metrology, Semiconducting wafers, Resolution enhancement technologies

Read Abstract +

Proceedings Article | 30 October 2007 Paper

Improvement of mask CD uniformity for below 45-nm node technology

HanKu Cho, Junghoon Park, Dongseok Nam, Sang-Gyun Woo, Byunggook Kim, Seokjong Bae, Hojune Lee

Proceedings Volume 6730, 67302Z (2007) https://doi.org/10.1117/12.746810

KEYWORDS: Electron beams, Curium, Etching, Ions, Chromium, Photomasks, Plasma etching, Critical dimension metrology, Photoresist processing, Information operations

Read Abstract +

Proceedings Article | 30 October 2007 Paper

The study of CD error in mid-local pattern area caused by develop loading effect

Byung-Gook Kim, Han-Ku Cho, Seong-Yoon Kim, Sang-Gyun Woo, Jung-Hun Lee, Man-Kyu Kang

Proceedings Volume 6730, 67300H (2007) https://doi.org/10.1117/12.746565

KEYWORDS: Electron beams, Error analysis, Control systems, Photoresist materials, Process control, Photomasks, Chemical analysis, Critical dimension metrology, Photoresist processing, Photoresist developing

Read Abstract +

Proceedings Article | 25 October 2007 Paper

A pragmatic approach to high sensitivity defect inspection in the presence of mask process variability

Chunlin Chen, Sang-Gyun Woo, Dong Hoon Chung, Gregg Inderhees, David Kim, Jin Hyung Park, Han Ku Cho, Ki-Hun Park, Sang Hoon Han

Proceedings Volume 6730, 673024 (2007) https://doi.org/10.1117/12.746567

KEYWORDS: Reticles, Defect detection, Opacity, Databases, Inspection, Photomasks, Optical proximity correction, SRAF, Semiconducting wafers, Defect inspection

Read Abstract +

Proceedings Article | 29 May 2007 Paper

Substrate effects on the characteristics of haze defect formation on the photomask surface under exposure condition

HanKu Cho, Sang-Gyun Woo, Byung Cheol Cha, Han-shin Lee, Jin-sik Jung, Jaehyuck Choi

Proceedings Volume 6607, 660709 (2007) https://doi.org/10.1117/12.728922

KEYWORDS: Air contamination, Ions, Sulfur, Surface roughness, Chromium, Profiling, Photomasks, Chemical analysis, Molybdenum, Industrial chemicals

Read Abstract +

Proceedings Article | 21 May 2007 Paper

Shot-based MRC flow by using full chip MRC tool

Sung-Hoon Jang, Ji-Hyeun Choi, Sung-Jun Son, Min-Kyu Ji, Han-Ku Cho, Sang-Gyun Woo

Proceedings Volume 6607, 66070V (2007) https://doi.org/10.1117/12.728945

KEYWORDS: Electronics, Error analysis, Manufacturing, Inspection, Photomasks, Optical proximity correction, SRAF, Data conversion, Resolution enhancement technologies, Defect inspection

Read Abstract +

Proceedings Article | 15 May 2007 Paper

New PEC optimization for the mask fabrication of sub-50-nm memory device

Dongguk Ryu, Dongseok Nam, Heebom Kim, Junghoon Park, Sanghee Lee, Byunggook Kim, Sanggyun Woo, Hanku Cho

Proceedings Volume 6607, 660725 (2007) https://doi.org/10.1117/12.728988

KEYWORDS: Electron beam lithography, Electron beams, Backscatter, Scattering, Laser scattering, Control systems, Monte Carlo methods, Photomasks, Optical proximity correction, Mask making

Read Abstract +

Proceedings Article | 15 May 2007 Paper

Robust approach to determine the optimized illumination condition using process window analysis

Sooryong Lee, Suk-Joo Lee, Yong-Jin Chun, Sung-Woo Lee, Young-Mi Lee, Brad Falch, Sungsoo Suh, Ho-Jin Park, Han-Ku Cho

Proceedings Volume 6607, 660737 (2007) https://doi.org/10.1117/12.729026

KEYWORDS: Lithography, Diffraction, Design for manufacturing, Photomasks, Image enhancement, Optical proximity correction, Nanoimprint lithography, Critical dimension metrology, Semiconducting wafers, Fiber optic illuminators

Read Abstract +

Several criteria are applied to optimize the best illumination and bias condition for a layer. Normalized image log-slope (NILS) and mask error enhancement factor (MEEF) are promising candidates to simply decide the optimized condition. NILS represents imaging capability and MEEF represents the mask uniformity influence on wafer image. MEEF has inversely relationship with NILS, but the optimized point of NILS does not exactly coincide with that of MEEF. Besides NILS and MEEF, the depth of focus (DoF) is an important factor for defining the process margin. The process window (PW) is expressed by DoF and exposure Latitude (EL). PW is general parameter used to determine the best lithographic condition. Large EL can be obtained at the condition with good image performance. In order to include mask uniformity effect in PW analysis, the common PW overlapping the final layout with positive and negative biased layouts is adopted. Starting with the minimum NA, sigma and threshold, OPC is performed to satisfy the target layout using aerial image model, and the final OPCed layout is obtained. The positive and negative biased layouts are generated from the final OPCed layout. The bias limit is determined considering mask uniformity. The common PW obtained by overlapping the final layout with positive and negative biased layouts is calculated. Then, NA, sigma and threshold are increased until the maximum values are reached. The common PW at each NA, sigma and threshold value is obtained using the same flow sequence. Comparing among calculated PWs, the NA, sigma and threshold of the maximum PW can be chosen as the best illuminator and bias condition. In this paper, the optimized illumination and bias condition is determined using PW for 60 nm memory device. The process flow is implemented by an OPC tool. By using the OPC tool for the illuminator optimization, the actual layout and multiple monitoring points can be measured. In spite of a large number of calculations, the fast calculation speed can be obtained by using the distributed process.

Proceedings Article | 14 May 2007 Paper

Study of mask structure for 45-nm node based on manufacturability and lithographic performance

Sung Won Kwon, Seong Yoon Kim, Byung Gook Kim, Sung Hyuck Kim, Jong Gul Doh, Yong Seung Moon, Sun Young Choi, Cheol Hong Park, Sang Gyun Woo, Bo Hye Kim, Han Ku Cho

Proceedings Volume 6607, 66071U (2007) https://doi.org/10.1117/12.728977

KEYWORDS: Lithography, Electron beam lithography, Etching, Manufacturing, Chromium, Photomasks, Optical simulations, Absorbance, Semiconducting wafers, Binary data

Read Abstract +

Proceedings Article | 14 May 2007 Paper

Process latitude dependency on local photomask haze defect in 70-nm binary intensity mask

Hye-Keun Oh, Young-Min Kang, Sung-Jin Kim, Jai-Soon Kim, Jin-Back Park, Wook Chang, Seung-Wook Park, Han-Koo Cho

Proceedings Volume 6607, 660720 (2007) https://doi.org/10.1117/12.728983

KEYWORDS: Semiconductors, Reticles, Air contamination, Crystals, Electroluminescence, Photomasks, Critical dimension metrology, Semiconducting wafers, Binary data, Phase shifts

Read Abstract +

Proceedings Article | 14 May 2007 Paper

Optical performance enhancement technique for 45-nm node with binary mask

Jeung-Woo Lee, Jin-Sik Jung, Han-Ku Cho, Hee-Bom Kim, Sang-Gyun Woo

Proceedings Volume 6607, 66071I (2007) https://doi.org/10.1117/12.728965

KEYWORDS: Oxides, Diffraction, Etching, Manufacturing, Chromium, Photomasks, Nanoimprint lithography, Binary data, Resolution enhancement technologies, Phase shifts

Read Abstract +

Proceedings Article | 14 May 2007 Paper

Requirements of nano-machining repair system for 45-nm node

Hyuk-Joo Kwon, Hong-Seok Shim, Su-Young Lee, Sang-Gyun Woo, Han-Ku Cho, Sang-Hyeon Lee, Geun-Bae Kim, Hwa-Sung Kim

Proceedings Volume 6607, 660712 (2007) https://doi.org/10.1117/12.728951

KEYWORDS: Diamond, Quartz, Chromium, Atomic force microscopy, Scanning electron microscopy, Transmittance, Photomasks, Critical dimension metrology, Neodymium, Adhesives

Read Abstract +

Proceedings Article | 12 May 2007 Paper

Scatterometry based profile metrology of two-dimensional patterns of EUV masks

Hanku Cho, Irina Pundaleva, Roman Chalykh, Byunggook Kim, Heebom Kim

Proceedings Volume 6607, 66070S (2007) https://doi.org/10.1117/12.728942

KEYWORDS: Diffraction, Metrology, Polarization, Scatterometry, 3D metrology, Photomasks, Extreme ultraviolet, Shape analysis, Extreme ultraviolet lithography, Scatter measurement

Read Abstract +

Proceedings Article | 5 April 2007 Paper

Image analysis of alignment and overlay marks with compound structure

Han-Ku Cho, Jang-Ho Shin, Irina Pundaleva, Joo-Tae Moon, Seong-Sue Kim, Roman Chalykh

Proceedings Volume 6518, 65182D (2007) https://doi.org/10.1117/12.711277

KEYWORDS: Semiconductors, Antireflective coatings, Finite-difference time-domain method, Optical lithography, Coating, Image analysis, Image quality, Optical alignment, Semiconducting wafers, Overlay metrology

Read Abstract +

Proceedings Article | 5 April 2007 Paper

Overlay metrology for dark hard mask process: simulation and experiment study

SukJoo Lee, Han-Ku Cho, Hyunjae Kang, Jangho Shin, SeongSue Kim, Roman Chalykh

Proceedings Volume 6518, 65182U (2007) https://doi.org/10.1117/12.711389

KEYWORDS: Semiconductors, Lithography, Image processing, Scanners, Photoresist materials, Image quality, Photomasks, Optical alignment, Semiconducting wafers, Overlay metrology

Read Abstract +

Proceedings Article | 27 March 2007 Paper

The choice of mask in consideration of polarization effects at high-NA system

Yong-Hoon Kim, Sung-Hyuck Kim, Jeung-Woo Lee, Han-Ku Cho, Soon-Ho Kim, Sang-Yong Yu

Proceedings Volume 6520, 65204R (2007) https://doi.org/10.1117/12.711318

KEYWORDS: Lithography, Optical lithography, Polarization, Image quality, Photomasks, Image enhancement, Immersion lithography, Binary data, Resolution enhancement technologies, Phase shifts

Read Abstract +

Proceedings Article | 26 March 2007 Paper

A method for generating assist-features in full-chip scale and its application to contact layers of sub-70-nm DRAM devices

Han-Ku Cho, Dong-Woon Park, Joo-Tae Moon, Chan Hwang, Sangwook Kim, Sukjoo Lee

Proceedings Volume 6520, 652028 (2007) https://doi.org/10.1117/12.713055

KEYWORDS: Lithography, Light sources, Manufacturing, Reliability, Image quality, Photomasks, Optical simulations, Optical proximity correction, Semiconducting wafers, Model-based design

Read Abstract +

Proceedings Article | 21 March 2007 Paper

Properties of EUVL masks as a function of capping layer and absorber stack structures

Han-Ku Cho, Hwan-Seok Seo, Seung-Yoon Lee, Joo-On Park, Hun Kim, Jinhong Park, Seong-Sue Kim

Proceedings Volume 6517, 65171G (2007) https://doi.org/10.1117/12.713301

KEYWORDS: Refractive index, Multilayers, Silicon, Reflectivity, Ion beams, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Molybdenum, Ruthenium

Read Abstract +

Proceedings Article | 20 March 2007 Paper

The effect of localized mask density variations on image quality in EUV lithography

Jinhong Park, HanKu Cho, Joo-Tae Moon, Seong-Sue Kim, Hwanseok Seo

Proceedings Volume 6517, 651723 (2007) https://doi.org/10.1117/12.713303

KEYWORDS: Lithography, Reticles, Light scattering, Reflectivity, Image quality, Photomasks, Extreme ultraviolet, Line width roughness, Extreme ultraviolet lithography, Stray light

Read Abstract +

Proceedings Article | 20 October 2006 Paper

Simulation of critical dimension and profile metrology based on scatterometry method

SeongSue Kim, Roman Chalykh, Han-Ku Cho, Irina Pundaleva, Joo-Tae Moon

Proceedings Volume 6349, 63491K (2006) https://doi.org/10.1117/12.688623

KEYWORDS: Diffraction, Metrology, Polarization, Light scattering, Magnetism, Scatterometry, Critical dimension metrology, Scatter measurement, Overlay metrology, Diffraction gratings

Read Abstract +

Proceedings Article | 20 October 2006 Paper

OPC to account for thick mask effect using simplified boundary layer model

Hanku Cho, Young-Chang Kim, Sook Lee, Sungsoo Suh, Sooryong Lee, Jootae Moon, Sukjoo Lee, Sungwoo Lee, Sangwook Kim, Jonathan Cobb

Proceedings Volume 6349, 63493I (2006) https://doi.org/10.1117/12.686394

KEYWORDS: Optical lithography, Polarization, Chromium, 3D modeling, Near field, Transmittance, Photomasks, Optical proximity correction, Critical dimension metrology, Binary data

Read Abstract +

Proceedings Article | 21 June 2006 Paper

Analysis method to determine and characterize the mask mean-to-target and uniformity specification

Sang-Gyun Woo, Vicky Philipsen, Jeroen Van de Kerkhove, Suk-Joo Lee, Han-Ku Cho, Rik Jonckheere, Sung-Woo Lee, Leonardus Leunissen, Joo-Tae Moon

Proceedings Volume 6281, 62810U (2006) https://doi.org/10.1117/12.692804

KEYWORDS: Cadmium, Polarization, Manufacturing, Photomasks, Logic devices, Mask making, Critical dimension metrology, Semiconducting wafers, Tolerancing, Fiber optic illuminators

Read Abstract +

Proceedings Article | 20 May 2006 Paper

Simulation and experiments for inspection properties of EUV mask defects

Han-Ku Cho, Joo-Tae Moon, Jinhong Park, SukJoo Lee, Seong-Sue Kim, Sang-Gyun Woo

Proceedings Volume 6283, 62833E (2006) https://doi.org/10.1117/12.681833

KEYWORDS: Confocal microscopy, Visible radiation, Defect detection, Deep ultraviolet, Imaging systems, Inspection, Reflectivity, Photomasks, Extreme ultraviolet, Semiconducting wafers

Read Abstract +

Proceedings Article | 29 March 2006 Paper

Spin-on hard mask with dual-BARC property for 50-nm devices

Yun Sook Chae, Joo-Tae Moon, Manhyoung Ryoo, Han-Ku Cho, Jung Hwan Hah, Sang-Jun Choi, Yun-Kyeong Jang, Sang-Gyun Woo

Proceedings Volume 6153, 61530L (2006) https://doi.org/10.1117/12.656075

KEYWORDS: Semiconductors, Carbon, Lithography, Optical properties, Etching, Silicon, Chemical vapor deposition, Photomasks, Immersion lithography, System on a chip

Read Abstract +

Proceedings Article | 29 March 2006 Paper

Top barrier coating materials for immersion lithography and beyond

Mitsuhiro Hata, Jin-Young Yoon, Jung-Hwan Hah, Sang-Jun Choi, Han-Ku Cho, Man-Hyoung Ryoo

Proceedings Volume 6153, 61531Y (2006) https://doi.org/10.1117/12.655955

KEYWORDS: Lithography, Polymers, Coating, Scanning electron microscopy, Photoresist materials, Extreme ultraviolet, Extreme ultraviolet lithography, Thin film coatings, Semiconducting wafers, Photoresist developing

Read Abstract +

Proceedings Article | 24 March 2006 Paper

Investigation on polarization monitoring mask: pattern design and experimental verification

Joo-Tae Moon, Dong-Seok Nam, Chan Hwang, Han-Ku Cho, Suk-Joo Lee, Dong-Woon Park, Sang-Gyun Woo, Jang-Ho Shin

Proceedings Volume 6152, 61521M (2006) https://doi.org/10.1117/12.657054

KEYWORDS: Diffraction, Reticles, Optical lithography, Lithographic illumination, Polarization, Polarizers, Printing, Photomasks, Critical dimension metrology, Semiconducting wafers

Read Abstract +

Proceedings Article | 24 March 2006 Paper

Improving model-based OPC performance for sub-60nm devices using real source optical model

Sunggon Jung, In-Sung Kim, Sang-Gyun Woo, Gi-Sung Yeo, HanKu Cho, Young-Seog Kang, Joo-Tae Moon

Proceedings Volume 6156, 61561H (2006) https://doi.org/10.1117/12.655954

KEYWORDS: Optical lithography, Data modeling, Calibration, Scanners, Error analysis, Image filtering, Optical proximity correction, Performance modeling, Model-based design, Instrument modeling

Read Abstract +

Proceedings Article | 24 March 2006 Paper

Macro analysis of line edge and line width roughness

Jangho Shin, Jinyoung Yoon, Youngjae Jung, Sang-Gyun Woo, Han-Ku Cho, SukJoo Lee, Joo-Tae Moon

Proceedings Volume 6152, 61520X (2006) https://doi.org/10.1117/12.655516

KEYWORDS: Semiconductors, Spectrum analysis, Statistical analysis, Polarization, Photoresist materials, Software development, Line width roughness, Transistors, Critical dimension metrology, Edge roughness

Read Abstract +

Proceedings Article | 23 March 2006 Paper

Defect inspection of EUV mask blank using confocal microscopy: simulation and experiment

Han-Ku Cho, Joo-Tae Moon, Roman Chalykh, Jiehun Kang, Seong-Sue Kim, Jinhong Park, Sang-Gyun Woo, SukJoo Lee

Proceedings Volume 6151, 61511C (2006) https://doi.org/10.1117/12.656221

KEYWORDS: Confocal microscopy, Microscopes, Data modeling, Silicon, Smoothing, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Molybdenum, Defect inspection

Read Abstract +

Proceedings Article | 15 March 2006 Paper

Mask topography effect on OPC at hyper-NA lithography

Sang-Wook Kim, Joo-Tae Moon, Sook Lee, Han-Ku Cho, In-Sung Kim, Yong-Jin Chun, Suk-Joo Lee, Sang-Gyun Woo

Proceedings Volume 6154, 61541R (2006) https://doi.org/10.1117/12.655998

KEYWORDS: Lithography, 3D acquisition, Data modeling, Diffusion, 3D modeling, Photomasks, Optical proximity correction, Optimization (mathematics), Binary data, 3D image processing

Read Abstract +

Proceedings Article | 14 March 2006 Paper

Toward DFM: process worthy design and OPC through verification method using MEEF, TF-MEEF, and MTT

Sunggon Jung, HanKu Cho, Sang-Gyun Woo, In-Sung Kim, Sungsoo Suh, Young-Seog Kang, Sukjoo Lee, Eunmi Lee

Proceedings Volume 6156, 61560L (2006) https://doi.org/10.1117/12.655482

KEYWORDS: Lithography, Visualization, Image processing, Manufacturing, Image quality, Design for manufacturing, Photomasks, Optical proximity correction, Critical dimension metrology, Semiconducting wafers

Read Abstract +

Proceedings Article | 5 November 2005 Paper

Pattern type specific modeling and correction methodology at high NA and off-axis illumination

In-sung Kim, Sang-gyun Woo, Sungsoo Suh, Hanku Cho, Joo-tae Moon, Young-seog Kang

Proceedings Volume 5992, 599220 (2005) https://doi.org/10.1117/12.632376

KEYWORDS: Reticles, Data modeling, Calibration, Image processing, Signal processing, Photomasks, Optical proximity correction, Semiconducting wafers, Model-based design, Process modeling

Read Abstract +

Proceedings Article | 12 May 2005 Paper

The application criterion of model-based optical proximity correction in a low k1 process

Joo-Tae Moon, Doo-Youl Lee, Myoung-Ho Jung, Joo-On Park, Seok-Hwan Oh, Han-Ku Cho, Sung-Gon Jung, In-Sung Kim, Sang-Gyun Woo

Proceedings Volume 5754, (2005) https://doi.org/10.1117/12.599013

KEYWORDS: Lithography, Scanners, Photography, Scanning electron microscopy, Photomasks, Optical proximity correction, Semiconducting wafers, Model-based design, Process modeling, Resolution enhancement technologies

Read Abstract +

Proceedings Article | 12 May 2005 Paper

Measurement technique of nontelecentricity of pupil-fill and its application to 60 nm NAND flash memory patterns

Chan Hwang, Sang-Gyun Woo, Jangho Shin, Han-Ku Cho, SukJoo Lee, SeongSue Kim, Joo-Tae Moon, Hochul Kim

Proceedings Volume 5754, (2005) https://doi.org/10.1117/12.598655

KEYWORDS: Reticles, Metrology, Optical lithography, Scanners, Photoresist materials, Image sensors, Semiconducting wafers, Optics manufacturing, Overlay metrology, Fiber optic illuminators

Read Abstract +

Proceedings Article | 12 May 2005 Paper

Requirement of in-field illumination control for low k1 imaging below 0.3

Chan Hwang, Han-Ku Cho, Sang-Gyun Woo, Suk-Joo Lee, Jangho Shin, Joo-Tae Moon

Proceedings Volume 5754, (2005) https://doi.org/10.1117/12.599532

KEYWORDS: Lithography, Optical lithography, Lithographic illumination, Imaging systems, Error analysis, Control systems, Computer simulations, Optical proximity correction, Critical dimension metrology, Error control coding

Read Abstract +

Proceedings Article | 12 May 2005 Paper

Era of double exposure in 70 nm node DRAM cell

Joo-Tae Moon, Seok-Hwan Oh, Han-Ku Cho, Tae-Young Kim, Sang-Jin Kim, Gi-Sung Yeo, Sang-Gyun Woo, Joon-Soo Park, Byeong-Soo Kim

Proceedings Volume 5754, (2005) https://doi.org/10.1117/12.599458

KEYWORDS: Lithography, Optical lithography, Lithographic illumination, Distortion, Monte Carlo methods, Photomasks, Double patterning technology, Critical dimension metrology, Personal protective equipment, Phase shifts

Read Abstract +

Proceedings Article | 10 May 2005 Paper

Optimization of geometry of alignment mark using rigorous coupled-wave analysis (RCWA)

Sang-Gyun Woo, Joo-Tae Moon, Han-Ku Cho, Seong-Sue Kim, Roman Chalykh

Proceedings Volume 5752, (2005) https://doi.org/10.1117/12.601142

KEYWORDS: Diffraction, Finite-difference time-domain method, Silica, Image quality, Near field, Signal processing, Extreme ultraviolet, Optical alignment, Overlay metrology, Diffraction gratings

Read Abstract +

Proceedings Article | 10 May 2005 Paper

Novel methodology of employing scatterometry to assess optical proximity correction test pattern

S. Suh, S. Woo, H. Cho, I. Kim, Y. Kang, S. Lee, E. Lee

Proceedings Volume 5752, (2005) https://doi.org/10.1117/12.598698

KEYWORDS: Metrology, Data modeling, Calibration, Inspection, Optical testing, Scatterometry, Optical proximity correction, Critical dimension metrology, Semiconducting wafers, Model-based design

Read Abstract +

Proceedings Article | 10 May 2005 Paper

Influence of material on process focus budget and process window of 80nm DRAM devices

Jangho Shin, HanKu Cho, Joo-Tae Moon, SukJoo Lee, Sung Won Choi, Sang-Gyun Woo

Proceedings Volume 5752, (2005) https://doi.org/10.1117/12.600166

KEYWORDS: Lithography, Polishing, Digital signal processing, Optical lithography, Scanners, Materials processing, Phase shift keying, Photomasks, Semiconducting wafers, Phase shifts

Read Abstract +

Proceedings Article | 6 May 2005 Paper

Defect printability and defect inspection simulations of patterned EUVL mask using rigorous coupled-wave analysis

Roman Chalyck, Seong-Sue Kim, Sang-Gyun Woo, Han-Ku Cho

Proceedings Volume 5751, (2005) https://doi.org/10.1117/12.600459

KEYWORDS: Confocal microscopy, Light sources, Inspection, Near field, Projection systems, Photomasks, Extreme ultraviolet lithography, Fourier optics, Near field optics, Defect inspection

Read Abstract +

Proceedings Article | 4 May 2005 Paper

In-line chemical shrink process for 70 nm contact hole patterns by the room-temperature electrostatic self-assembly

Subramanya Mayya, Sang-Gyun Woo, Hyun-Woo Kim, Joo-Tae Moon, Jung Hwan Hah, Byung-Il Ryu, Man-Hyoung Ryoo, Han-Ku Cho, Mitsuhiro Hata

Proceedings Volume 5753, (2005) https://doi.org/10.1117/12.599450

KEYWORDS: Lithography, Optical lithography, Polymers, Interfaces, Hydrogen, Scanning electron microscopy, Semiconductor manufacturing, Chemical reactions, Photoresist processing, Resolution enhancement technologies

Read Abstract +

Proceedings Article | 4 May 2005 Paper

Application of bi-layer resist on 70 nm node memory devices

Han-Ku Cho, Hyung-Rae Lee, Joo-Tae Moon, Yool Kang, Shi-Yong Lee, Jin Hong, Sang-Gyun Woo, Man-Hyoung Ryoo

Proceedings Volume 5753, (2005) https://doi.org/10.1117/12.599484

KEYWORDS: Lithography, Optical lithography, Etching, Dry etching, Silicon, Chemistry, Photomasks, Line width roughness, Photoresist processing, Semiconducting wafers

Read Abstract +

Proceedings Article | 4 May 2005 Paper

Novel chemical shrinkage material for small contact hole and small space patterning

Sang-Gyun Woo, Jung-Hwan Hah, Mitsuhiro Hata, Hyun-Woo Kim, Man-Hyoung Ryoo, Han-Ku Cho

Proceedings Volume 5753, (2005) https://doi.org/10.1117/12.599468

KEYWORDS: Magnesium, Optical lithography, Polymers, Scanning electron microscopy, Photoresist materials, Chemical reactions, Critical dimension metrology, Semiconducting wafers, Industrial chemicals, Resolution enhancement technologies

Read Abstract +