Fabrication technique of nanograting using AFM

Huimin Xie; Zhanwei Liu; Ming Zhang; Wei Zhang; Anand Asundi

doi:10.1117/12.663058

27 April 2006 Fabrication technique of nanograting using AFM

Huimin Xie, Zhanwei Liu, Ming Zhang, Wei Zhang, Anand Asundi

Proceedings Volume 6188, Optical Micro- and Nanometrology in Microsystems Technology; 618807 (2006) https://doi.org/10.1117/12.663058
Event: SPIE Photonics Europe, 2006, Strasbourg, France

Abstract

On the basis of the mechanically scratching using the Atomic Force Microscope, this paper proposes a new method for manufacturing high frequency grating. The grating was fabricated on a polycarbonate compact disc with a silicon AFM tip under the contact mode. The fabrication technique and the optimization of parameters for the technique are discussed in detail. From the experiment, the minimum spacing of the grating can reach 30 nm. The digital nano-moire patterns verify that the grating has good potential to be applied to the nano-deformation measurement.

Citation Download Citation

Huimin Xie, Zhanwei Liu, Ming Zhang, Wei Zhang, and Anand Asundi "Fabrication technique of nanograting using AFM", Proc. SPIE 6188, Optical Micro- and Nanometrology in Microsystems Technology, 618807 (27 April 2006); https://doi.org/10.1117/12.663058

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