Automated mask qualification with new CD metrology in CATS environment

Herman Boerland; Ronald J. Lesnick Jr.

doi:10.1117/12.686276

20 October 2006 Automated mask qualification with new CD metrology in CATS environment

Herman Boerland, Ronald J. Lesnick Jr.

Proceedings Volume 6349, Photomask Technology 2006; 634942 (2006) https://doi.org/10.1117/12.686276
Event: SPIE Photomask Technology, 2006, Monterey, California, United States

Abstract

With every new process generation mask complexity and costs continue to increase, driving new requirements for critical dimension control and mask qualification. Identifying and categorizing features to be measured and verified during mask qualification has now become critical to ensure high yielding masks. Traditional line width and spacing measurements are no longer sufficient for CD metrology systems. Next-generation CD-SEM systems and software tools now include more complex mask metrology requirements including measurements of pitch, "ternary contact", corner rounding, overlay, and line-edge roughness. Additionally these systems have started providing the capability for multiple measurement sites within a single field-of-view. In advanced mask production facilities, mask qualification recipes are commonly generated offline to improve the quality and efficiency of such qualifications. Offline recipe generation has become even more important since new process generations require an increasing number of measurements per mask. This paper describes offline recipe generation procedures using CATS^TM marking, also referred to as 'software tools' to utilize the new features of advanced CD-SEM metrology systems.

Citation Download Citation

Herman Boerland and Ronald J. Lesnick Jr. "Automated mask qualification with new CD metrology in CATS environment", Proc. SPIE 6349, Photomask Technology 2006, 634942 (20 October 2006); https://doi.org/10.1117/12.686276

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KEYWORDS

Computed tomography

Critical dimension metrology

Metrology

Scanning electron microscopy

Chromium

Distance measurement

Quality measurement

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