Deep subwavelength mask assist features and mask errors printability in high NA lithography

Wen-Hao Cheng; Mindy Lee; Vikram Tolani; Mark Nakahma; Bob Gleason

doi:10.1117/12.686378

20 October 2006 Deep subwavelength mask assist features and mask errors printability in high NA lithography

Wen-Hao Cheng, Mindy Lee, Vikram Tolani, Mark Nakahma, Bob Gleason

Proceedings Volume 6349, Photomask Technology 2006; 63494W (2006) https://doi.org/10.1117/12.686378
Event: SPIE Photomask Technology, 2006, Monterey, California, United States

Abstract

As silicon processes scale toward the 45 nm node using conventional 0.25 magnification, widths of sub-resolution assist feature (SRAF) and printable defects on photomasks drop far below the ArF laser wavelength. Adoption of polarized illumination and higher numerical aperture (NA) could invalidate the scaling relations we used in the past to determine which small mask features or errors will print on wafers. Polarization interaction with small mask features may also plays a role in mask inspection. As mask features shrink below the wavelength, differences between the optical systems used for inspection and printing become more significant, and may affect the rules for disposition of inspection results. The data presented here combines experimental results from high NA imaging of sub-wavelength SRAF and defects, with rigorous calculation of their images based on vector diffraction. The printability of these deep subwavelength mask feature determines the requirements of optical model's rigorousness for SRAF design rule and also mask defect inspection and repair capabilities.

Citation Download Citation

Wen-Hao Cheng, Mindy Lee, Vikram Tolani, Mark Nakahma, and Bob Gleason "Deep subwavelength mask assist features and mask errors printability in high NA lithography", Proc. SPIE 6349, Photomask Technology 2006, 63494W (20 October 2006); https://doi.org/10.1117/12.686378

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available

Members: $17.00

Non-members: $21.00 ADD TO CART

PROCEEDINGS
7 PAGES

DOWNLOAD PAPER SAVE TO MY LIBRARY

GET CITATION

RIGHTS & PERMISSIONS

Get copyright permission Get copyright permission on Copyright Marketplace

KEYWORDS

Photomasks

SRAF

Polarization

Finite-difference time-domain method

Optical proximity correction

Inspection

Chromium

Show All Keywords

Keywords/Phrases

Search In:

Publication Years