Performance comparison of techniques for intra-field CD control improvement

Rainer Pforr; Mario Hennig; Jens Reichelt; Guy Ben Zvi; Martin Sczyrba

doi:10.1117/12.746695

30 October 2007 Performance comparison of techniques for intra-field CD control improvement

Rainer Pforr, Mario Hennig, Jens Reichelt, Guy Ben Zvi, Martin Sczyrba

Proceedings Volume 6730, Photomask Technology 2007; 673032 (2007) https://doi.org/10.1117/12.746695
Event: SPIE Photomask Technology, 2007, Monterey, California, United States

Abstract

Intra-field CD variation is a main contributor to the total CD variation budget in IC manufacturing. It is essentially caused by mask CD variations and imperfections of the exposure tool. Techniques to reduce the IF CD error will be introduced. Tool and mask based CDU improvement techniques will be compared. Their CDU improvement potential and their correction accuracy will be analyzed. The correction methodology will be discussed, specifically none-wafer based CD measurement techniques as correction data input. Implementation efforts of the techniques will be compared.

Citation Download Citation

Rainer Pforr, Mario Hennig, Jens Reichelt, Guy Ben Zvi, and Martin Sczyrba "Performance comparison of techniques for intra-field CD control improvement", Proc. SPIE 6730, Photomask Technology 2007, 673032 (30 October 2007); https://doi.org/10.1117/12.746695

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