TEM validation of CD AFM image reconstruction: part II

Gregory A. Dahlen; Hao-Chih Liu; Marc Osborn; Jason R. Osborne; Bryan Tracy; Amalia del Rosario

doi:10.1117/12.773237

22 March 2008 TEM validation of CD AFM image reconstruction: part II

Gregory A. Dahlen, Hao-Chih Liu, Marc Osborn, Jason R. Osborne, Bryan Tracy, Amalia del Rosario

Proceedings Volume 6922, Metrology, Inspection, and Process Control for Microlithography XXII; 69220K (2008) https://doi.org/10.1117/12.773237
Event: SPIE Advanced Lithography, 2008, San Jose, California, United States

Abstract

The present paper is a continuation of an investigation to validate CD AFM image reconstruction using Transmission Electron Microscopy (TEM) as the Reference Metrology System (RMS). In the present work, the validation of CD AFM with TEM is extended to include a 26 nm diameter carbon nanotube (CNT) tip for non-reentrant feature scans. The use of DT (deep trench) mode and a CNT tip provides detailed bottom feature resolution and close mid-CD agreement with both TEM and prior CD mode AFM scans (using a high resolution Trident tip). Averaging AFM scan lines within the ~80 nm thickness region of the TEM sample is found to reduce systematic error with the RMS. Similarly, errors in alignment between AFM scan lines and TEM sample are corrected by a moving average method. Next, the NanoCD standard is used for complete 2D tip shape reconstruction (non-reentrant) utilizing its traceable feature width and well-defined upper-corner radius. The shape of the NanoCD is morphologically removed from the tip/standard image, thus providing the tip's shape with bounded dimensional uncertainty. Finally, an update of the measurement uncertainty budget for the current generation CD AFM is also presented, thus extending the prior work by NIST.

Citation Download Citation

Gregory A. Dahlen, Hao-Chih Liu, Marc Osborn, Jason R. Osborne, Bryan Tracy, and Amalia del Rosario "TEM validation of CD AFM image reconstruction: part II", Proc. SPIE 6922, Metrology, Inspection, and Process Control for Microlithography XXII, 69220K (22 March 2008); https://doi.org/10.1117/12.773237

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