Hotspot monitoring system with contour-based metrology

A. Kawamoto; Y. Tanaka; S. Tsuda; K. Shibayama; S. Furukawa; H. Abe; T. Mitsui; Y. Yamazaki

doi:10.1117/12.814022

23 March 2009 Hotspot monitoring system with contour-based metrology

A. Kawamoto, Y. Tanaka, S. Tsuda, K. Shibayama, S. Furukawa, H. Abe, T. Mitsui, Y. Yamazaki

Proceedings Volume 7272, Metrology, Inspection, and Process Control for Microlithography XXIII; 72721F (2009) https://doi.org/10.1117/12.814022
Event: SPIE Advanced Lithography, 2009, San Jose, California, United States

Abstract

As design rules shrink, hotspot management is becoming increasingly important. In this paper, an automatic system of hotspot monitoring that is the final step in the hotspot management flow is proposed. The key technology for the automatic hotspot monitoring is contour-based metrology. It is an effective method of evaluating complex patterns, such as hotspots, whose efficiency has been proved in the field of optical proximity correction (OPC) calibration. The contour-based metrology is utilized in our system as a process control tool available on mass-production lines. The pattern evaluation methodology has been developed in order to achieve high sensitivity. Lithography simulation decides a hotspot to be monitored and furthermore indicates the most sensitive points in the field of view (FOV) of a hotspot image. And quantification of the most sensitive points is consistent with an engineer's visual check of a shape of a hotspot. Its validity has been demonstrated in process window determination. This system has the potential to substantially shorten turnaround time (TAT) for hotspot monitoring.

Citation Download Citation

A. Kawamoto, Y. Tanaka, S. Tsuda, K. Shibayama, S. Furukawa, H. Abe, T. Mitsui, and Y. Yamazaki "Hotspot monitoring system with contour-based metrology", Proc. SPIE 7272, Metrology, Inspection, and Process Control for Microlithography XXIII, 72721F (23 March 2009); https://doi.org/10.1117/12.814022

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