Zero-phonon-line pumped 100-kHz Yb:YAG thin disk regenerative amplifier

Taisuke Miura; Martin Smrž; Siva Sankar Nagisetty; Ondřej Novák; Michal Chyla; Patricie Severová; Akira Endo; Tomáš Mocek

doi:10.1117/12.2040227

28 February 2014 Zero-phonon-line pumped 100-kHz Yb:YAG thin disk regenerative amplifier

Taisuke Miura, Martin Smrž, Siva Sankar Nagisetty, Ondřej Novák, Michal Chyla, Patricie Severová, Akira Endo, Tomáš Mocek

Author Affiliations +

Proceedings Volume 8959, Solid State Lasers XXIII: Technology and Devices; 895923 (2014) https://doi.org/10.1117/12.2040227
Event: SPIE LASE, 2014, San Francisco, California, United States

Abstract

We are developing 100-kHz picosecond Yb:YAG thin disk regenerative amplifier with 500-W average power for medical and industrial applications. Especially in case of the next generation of semiconductor lithography, high average power solid-state laser with picosecond pulse duration as pre pulse source is a key element to realize 1-kW EUV lithography source. We compared the output characteristics of CW laser operation pumped at 940-nm and 969-nm, and measured the surface temperature of thin disk. We found that the surface temperature of thin disk pumped at 960-nm was much lower than that pumped at 940-nm. We obtained 83-W output from thin disk regenerative amplifier at the repetition rate of 100-kHz pumped at 969-nm. The measured pulse duration was 1.9-ps.

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Taisuke Miura, Martin Smrž, Siva Sankar Nagisetty, Ondřej Novák, Michal Chyla, Patricie Severová, Akira Endo, and Tomáš Mocek "Zero-phonon-line pumped 100-kHz Yb:YAG thin disk regenerative amplifier", Proc. SPIE 8959, Solid State Lasers XXIII: Technology and Devices, 895923 (28 February 2014); https://doi.org/10.1117/12.2040227

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