Paper
8 October 2014 New grade of 9-inch size mask blanks for 450mm wafer process
Noriyuki Harashima, Hiroyuki Iso, Tatsuya Chishima
Author Affiliations +
Abstract
6-inch size (known as 6025QZ) binary Cr mask is widely used in the semiconductor lithography for over 20years. Recently for the 450mm wafer process, high grade 9-inch size mask is expected. For this application, we have studied and developed new grade 9-inch size mask blanks for recent 450mm wafer process requirement. There are three types of glass substrates material use and select as 9inch size mask blanks and for required applications by the users. Each glass material has advantage and disadvantage for lithography process as well as wafer process. By knowing the each glass substrate material characteristics and quality level the users enable to select the proper 9inch mask blanks for their targeting applications.
© (2014) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Noriyuki Harashima, Hiroyuki Iso, and Tatsuya Chishima "New grade of 9-inch size mask blanks for 450mm wafer process", Proc. SPIE 9235, Photomask Technology 2014, 92351M (8 October 2014); https://doi.org/10.1117/12.2066075
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KEYWORDS
Photomasks

Semiconducting wafers

Glasses

Quartz

Coating

Polishing

Lithography

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