Effect of pattern transfer process on roughness of block copolymer patterns from directed self-assembly

Whitney Loo; Boyce Chang; Beihang Yu; Scott Dhuey; Ricardo Ruiz; Paul Nealey

doi:10.1117/12.2614072

13 June 2022 Effect of pattern transfer process on roughness of block copolymer patterns from directed self-assembly

Whitney Loo, Boyce Chang, Beihang Yu, Scott Dhuey, Ricardo Ruiz, Paul Nealey

Proceedings Volume PC12054, Novel Patterning Technologies 2022; PC1205403 (2022) https://doi.org/10.1117/12.2614072
Event: SPIE Advanced Lithography + Patterning, 2022, San Jose, California, United States

Abstract

Directed self-assembly of block copolymers enables the fabrication of uniform patterns with low defectivity and highly tunable feature sizes. Many pattern transfer strategies have been developed to minimize the roughness including a “dry” liftoff and Sequential Infiltration Synthesis (SIS). Here we compare both techniques and offer some insights on their advantages and disadvantages on aligned DSA patterns as well as self-assembled fingerprint patterns.

Conference Presentation

Citation Download Citation

Whitney Loo, Boyce Chang, Beihang Yu, Scott Dhuey, Ricardo Ruiz, and Paul Nealey "Effect of pattern transfer process on roughness of block copolymer patterns from directed self-assembly", Proc. SPIE PC12054, Novel Patterning Technologies 2022, PC1205403 (13 June 2022); https://doi.org/10.1117/12.2614072

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