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30 November 2018 Special Section Guest Editorial: Control of Integrated Circuit Patterning Variance, Part 3: Pattern Roughness, Local Uniformity, and Stochastic Defects
John C. Robinson, Tim Brunner, Gian Lorusso
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Journal of Micro/Nanolithography, MEMS, and MOEMS, Vol. 17, Issue 4, 041000 (November 2018). https://doi.org/10.1117/1.JMM.17.4.041000
Abstract
This guest editorial summarizes the Special Section on Control of Integrated Circuit Patterning Variance, Part 3: Pattern Roughness, Local Uniformity, and Stochastic Defects
© 2018 Society of Photo-Optical Instrumentation Engineers (SPIE)
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John C. Robinson, Tim Brunner, and Gian Lorusso "Special Section Guest Editorial: Control of Integrated Circuit Patterning Variance, Part 3: Pattern Roughness, Local Uniformity, and Stochastic Defects," Journal of Micro/Nanolithography, MEMS, and MOEMS 17(4), 041000 (30 November 2018). https://doi.org/10.1117/1.JMM.17.4.041000
Published: 30 November 2018
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KEYWORDS
Stochastic processes
Optical lithography
Integrated circuits
Line edge roughness
Extreme ultraviolet lithography
Line width roughness
Metrology
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