Ami Berger
Product Specialist at Applied Materials
SPIE Involvement:
Author
Publications (2)

Proceedings Article | 23 March 2011 Paper
Ping Xu, Yongmei Chen, Yijian Chen, Liyan Miao, Shiyu Sun, Sung-Woo Kim, Ami Berger, Daxin Mao, Christ Bencher, Raymond Hung, Chris Ngai
Proceedings Volume 7973, 79731Q (2011) https://doi.org/10.1117/12.881547
KEYWORDS: Etching, Optical lithography, Silicon, Scanning electron microscopy, Line width roughness, Lithography, Double patterning technology, Semiconducting wafers, Oxides, Neodymium

Proceedings Article | 22 March 2008 Paper
Ami Berger, Sergey Latinsky, Maayan Bar-Zvi, Ram Peltinov, Jen Shu, Chris Ngai, James Yu, Huixiong Dai
Proceedings Volume 6922, 692211 (2008) https://doi.org/10.1117/12.774408
KEYWORDS: Line edge roughness, Etching, Semiconducting wafers, Scanning electron microscopy, Double patterning technology, Metrology, Line width roughness, Edge roughness, Process control, Critical dimension metrology

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