Dr. Andrey A. Tatarintsev Profile

Dr. Andrey A. Tatarintsev

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Publications (6)

Proceedings Article | 31 January 2022 Paper

Investigation of plasma resistance of the HSQ electronic resist for prototyping of nanoelectronic devices

A. Miakonkikh, A. Shishlyannikov, A. Tatarintsev, V. Kuzmenko, K. Rudenko, E. Gornev

Proceedings Volume 12157, 1215717 (2022) https://doi.org/10.1117/12.2626386

KEYWORDS: Etching, Silicon, Plasma, Plasma etching

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Proceedings Article | 31 January 2022 Paper

Cobalt subtractive etch for advanced interconnects

A. Rogozhin, A. Miakonkikh, A. Tatarintsev, I. Amirov, K. Rudenko

Proceedings Volume 12157, 1215718 (2022) https://doi.org/10.1117/12.2624333

KEYWORDS: Etching, Cobalt, Plasma, Plasma etching, Polymethylmethacrylate, Copper, Reactive ion etching, Scanning electron microscopy, Metals

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Proceedings Article | 15 March 2019 Paper

Fabrication and properties of SOI-based planar silicon nanowire arrays

Alexander Rogozhin, Andrey Miakonkikh, Andrey Tatarintsev, Konstantin Rudenko

Proceedings Volume 11022, 1102222 (2019) https://doi.org/10.1117/12.2522457

KEYWORDS: Silicon, Nanowires, Oxidation, Plasma etching, Nanolithography, Wet etching

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Proceedings Article | 30 December 2016 Paper

Technology for fabrication of sub-20 nm silicon planar nanowires array

Andrey Miakonkikh, Andrey Tatarintsev, Alexander Rogozhin, Konstantin Rudenko

Proceedings Volume 10224, 102241V (2016) https://doi.org/10.1117/12.2267112

KEYWORDS: Nanowires, Oxidation, Silicon, Reactive ion etching, Thermal oxidation, Etching, Plasma etching, Wet etching, Plasma, Electron beam lithography

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Proceedings Article | 30 December 2016 Paper

Silicon ohmic lateral-contact MEMS switch for RF applications

A. Rogozhin, A. Miakonkikh, A. Tatarintsev, K. Lebedev, V. Kalnov, K. Rudenko, V. Lukichev

Proceedings Volume 10224, 1022419 (2016) https://doi.org/10.1117/12.2267093

KEYWORDS: Switches, Microelectromechanical systems, Silicon, Electrodes, Etching, Dry etching, Control systems, Electron beam lithography, Fluorine, Semiconducting wafers

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Proceedings Article | 30 December 2016 Paper

Optical coefficients of nanometer-thick copper and gold films in microwave frequency range

I. Khorin, N. Orlikovsky, A. Rogozhin, A. Tatarintsev, S. Pronin, V. Andreev, V. Vdovin

Proceedings Volume 10224, 1022407 (2016) https://doi.org/10.1117/12.2266504

KEYWORDS: Copper, Gold, Microwave radiation, Metals, Thin films, Scanning electron microscopy, Sputter deposition, Quartz, Sensors, Silicon

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Showing 5 of 6 publications

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