Dr. Aurélie Le Pennec
at CEA-Grenoble
SPIE Involvement:
Author
Publications (4)

Proceedings Article | 22 February 2021 Presentation + Paper
Jonathan Pradelles, Loïc Perraud, Aurélien Fay, Elie Sezestre, Jean-Baptiste Henry, Jessy Bustos, Estelle Guyez, Sébastien Berard-Bergery, Aurélie Le Pennec, Mohamed Abaidi, Jordan Belissard, Nivea Schuch, Matthieu Millequant, Thiago Figueiro, Patrick Schiavone
Proceedings Volume 11611, 1161110 (2021) https://doi.org/10.1117/12.2583843

Proceedings Article | 3 April 2020 Paper
G. Rademaker, A. Le Pennec, T. Giammaria, K. Benotmane, H. Pham, C. Bouet, M. G. Gusmao Cacho, M. Argoud, M.-L. Pourteau, A. Paquet, A. Gharbi, C. Navarro, C. Nicolet, X. Chevalier, K. Sakavuyi, P. Nealey, R. Tiron
Proceedings Volume 11326, 113260Z (2020) https://doi.org/10.1117/12.2552003
KEYWORDS: Lithography, Metrology, Directed self assembly, Immersion lithography, Photomasks, Optical lithography, Etching, Critical dimension metrology, Semiconducting wafers

Proceedings Article | 25 March 2020 Paper
Aurélie Le Pennec, Jérôme Rêche, Patrick Quéméré, Guido Rademaker, Romain Jarnias, Charlotte Bouet, Célia Nicolet, Christophe Navarro, Maxime Argoud, Raluca Tiron
Proceedings Volume 11326, 113261I (2020) https://doi.org/10.1117/12.2551854
KEYWORDS: Line width roughness, Ultraviolet radiation, Edge detection, Polymethylmethacrylate, Directed self assembly, Binary data, Polymerization, Statistical analysis, Software development

Proceedings Article | 26 March 2019 Paper
A. Paquet, A. Le Pennec, A. Gharbi, T. Giammaria, G. Rademaker, M.-L. Pourteau, D. Mariolle, C. Navarro, C. Nicolet, X. Chevalier, K. Sakavuyi, L. Pain, P. Nealey, R. Tiron
Proceedings Volume 10958, 109580M (2019) https://doi.org/10.1117/12.2514960
KEYWORDS: Etching, Lithography, Optical lithography, Wet etching, HF etching, Critical dimension metrology, Silicon, System on a chip, Tin

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