Dr. Byunghoon Lee Profile

Dr. Byunghoon Lee

at SAMSUNG Electronics Co Ltd

SPIE Involvement:

Author

Publications (5)

Proceedings Article | 16 November 2022 Presentation

Damage-free pinpoint particle removal for EUV pellicle cleaning

Hyun-Gyu Kang, Dong Hyeon Kwon, Tae-Gon Kim, Jin-Ho Ahn, Byung-Hoon Lee, Jin-Goo Park, Hwan Seok Seo, Hee Bom Kim

Proceedings Volume PC12293, PC1229308 (2022) https://doi.org/10.1117/12.2641583

KEYWORDS: Pellicles, Particles, Extreme ultraviolet, Safety, Particle systems, Particle contamination, Atomic force microscopy, Silica, Optical microscopes, Nanomanipulation

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Proceedings Article | 25 March 2019 Presentation + Paper

Multiscale approach for modeling EUV patterning of chemically amplified resist

Hyungwoo Lee, Muyoung Kim, Junghwan Moon, Sungwoo Park, Byunghoon Lee, Changyoung Jeong, Maenghyo Cho

Proceedings Volume 10960, 1096008 (2019) https://doi.org/10.1117/12.2514840

KEYWORDS: Diffusion, Polymers, Chemical reactions, Extreme ultraviolet lithography, Line edge roughness, Extreme ultraviolet, Chemically amplified resists, Photoresist materials, Optical lithography

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Proceedings Article | 19 March 2018 Paper

Theoretical modeling of PEB procedure on EUV resist using FDM formulation

Muyoung Kim, Junghwan Moon, Joonmyung Choi, Byunghoon Lee, Changyoung Jeong, Heebom Kim, Maenghyo Cho

Proceedings Volume 10583, 1058323 (2018) https://doi.org/10.1117/12.2296494

KEYWORDS: Diffusion, Polymers, Chemical reactions, Extreme ultraviolet lithography, Photoresist materials, Line edge roughness, Electrons, Molecules, Finite difference methods

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Proceedings Article | 24 March 2017 Paper

Computational approach on PEB process in EUV resist: multi-scale simulation

Muyoung Kim, Junghwan Moon, Joonmyung Choi, Byunghoon Lee, Changyoung Jeong, Heebom Kim, Maenghyo Cho

Proceedings Volume 10143, 101432E (2017) https://doi.org/10.1117/12.2266540

KEYWORDS: Extreme ultraviolet lithography, Computer simulations, Photoresist processing, Line edge roughness, Chemical reactions, Photoresist materials, Photochemistry, Semiconductors, Photoresist developing, Diffusion, Molecules, Electrons, Polymers, Monte Carlo methods

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Proceedings Article | 27 March 2014 Paper

Advanced develop processes for reducing defects related with e-beam resists

Byunghoon Lee, Sung-Jae Han, Se-Gun Moon, Hee Bom Kim

Proceedings Volume 9051, 90510W (2014) https://doi.org/10.1117/12.2047368

KEYWORDS: Photomasks, Photoresist processing, Standards development, Manufacturing, Semiconducting wafers, Inspection, Extreme ultraviolet, Optics manufacturing, EUV optics, Surface properties

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