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Christopher Carr
at IBM Thomas J Watson Research Ctr
SPIE Involvement:
Author
Publications (1)
Proceedings Article | 28 April 2023 Presentation + Paper
Impact of high-NA half-field to full-field overlay performance by Monte Carlo simulations
Proceedings Volume 12494, 124940S (2023) https://doi.org/10.1117/12.2661339
KEYWORDS: Monte Carlo methods, Extreme ultraviolet lithography, Scanners, Deep ultraviolet, Design and modelling, Semiconducting wafers, Overlay metrology, Photomasks, Extreme ultraviolet, Error analysis
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