Mr. Daniel H. Liu Profile

Daniel H. Liu

Senior Photo Process Engineer at TDK Headway Technologies

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Author

Publications (5)

Proceedings Article | 16 March 2009 Paper

A manufacturing lithographic approach for high density MRAM device using KrF double mask patterning technique

Daniel Liu, Tom Zhong, Terry Torng

Proceedings Volume 7274, 72743F (2009) https://doi.org/10.1117/12.807753

KEYWORDS: Photomasks, Double patterning technology, Lithography, Chemical mechanical planarization, Manufacturing, Optical lithography, Semiconducting wafers, Tolerancing, Magnetism, Etching

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Proceedings Article | 24 March 2006 Paper

Contact-area metrology of magnetic tunneling junction structures

Tom Zhong, Daniel Liu, Amit Moran, Michael Levkovitch, Michael Har-Zvi, Bob Burkhardt

Proceedings Volume 6152, 61522L (2006) https://doi.org/10.1117/12.659739

KEYWORDS: Critical dimension metrology, Resistance, Magnetism, Process control, Metrology, Semiconducting wafers, Algorithm development, Mobile devices, Cell phones, Consumer electronics

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Proceedings Article | 18 August 2000 Paper

Advanced lithography kits: serifs and hammerhead

Hang-Yip Liu, Steffen Schulze, Alan Thomas, Anne McGuire, Michael Cross

Proceedings Volume 4181, (2000) https://doi.org/10.1117/12.395715

KEYWORDS: Lithography, Photomasks, Resolution enhancement technologies, Optical lithography, Printing, Mask making, Inspection, Scanning electron microscopy

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Proceedings Article | 11 June 1999 Paper

Selection of attenuated phase shift mask compatible contact hole resists for KrF optical lithography

Zhijian Lu, Yuping Cui, Alan Thomas, Scott Mansfield, Gerhard Kunkel, David Dobuzinsky, Franz Zach, Daniel Liu, K. Rex Chen, George Jordhamo, Alois Gutmann, Timothy Farrell

Proceedings Volume 3678, (1999) https://doi.org/10.1117/12.350280

KEYWORDS: Printing, Etching, Photomasks, Oxides, Phase shifts, Lithography, Optical lithography, Optical properties, Electroluminescence, Resistance

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Proceedings Article | 10 June 1994 Paper

High-resolution spectra of cross-phase-modulation for an A/D converter

Peng Ho, Quan-Zhen Wang, Q. Liu, Daniel Liu, Robert Alfano

Proceedings Volume 2155, (1994) https://doi.org/10.1117/12.177425

KEYWORDS: Spectral resolution, Light, Nonlinear dynamics, Ultrafast phenomena, Picosecond phenomena, Modulation, Data conversion, Optical resolution, Laser sources, Nonlinear optics

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