David Ockwell
at Infinitesima Ltd
SPIE Involvement:
Author
Publications (1)

Proceedings Article | 20 March 2020 Paper
Proceedings Volume 11325, 113252H (2020) https://doi.org/10.1117/12.2551693
KEYWORDS: Microscopes, Image quality, Photomasks, Metrology, 3D metrology, Manufacturing, Semiconducting wafers, Line edge roughness, Chemical mechanical planarization, Structural design

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