Dr. Dmitry Levko
at Esgee Technologies Inc
SPIE Involvement:
Author
Publications (1)

Proceedings Article | 13 June 2022 Presentation
Dmitry Levko, Rochan Upadhyay, Kenta Suzuki, Chandrasekhar Shukla, Laxminarayan Raja
Proceedings Volume PC12056, PC1205606 (2022) https://doi.org/10.1117/12.2614241
KEYWORDS: Semiconductors, Plasma, Process engineering, Process modeling, Ions, Very large scale integration, Tolerancing, Semiconductor process engineering, Gases, Etching

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