Mr. Doguscan Ahiboz Profile

Doguscan Ahiboz

at Helmholtz-Zentrum Berlin

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Publications (1)

Proceedings Article | 8 March 2019 Presentation

Development of electron-selective SiO2/TiO2 stack layers with superior surface passivation capacity for n-type silicon substrates (Conference Presentation)

Hisham Nasser, Doguscan Ahiboz, Ezgi Aygun, Mona Zolfaghari Borra, Ozan Akdemir, Alpan Bek, Rasit Turan

Proceedings Volume 10919, 1091928 (2019) https://doi.org/10.1117/12.2510433

KEYWORDS: Silicon, Atomic layer deposition, Titanium dioxide, Semiconducting wafers, Wafer-level optics, Diodes, Temperature metrology, Chemical analysis, Spectroscopic ellipsometry, Heterojunctions

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