Hee-Ra No
at Hanyang Univ
SPIE Involvement:
Author
Publications (2)

Proceedings Article | 9 October 2018 Presentation + Paper
Proceedings Volume 10809, 108091G (2018) https://doi.org/10.1117/12.2502784
KEYWORDS: Particles, Extreme ultraviolet, Pellicles, Critical dimension metrology, Optical lithography, Extreme ultraviolet lithography, Photomasks, Contamination, Applied physics, Lithography

Proceedings Article | 24 March 2017 Paper
Proceedings Volume 10143, 101431U (2017) https://doi.org/10.1117/12.2261827
KEYWORDS: Critical dimension metrology, Optical proximity correction, Extreme ultraviolet lithography, Distortion, Extreme ultraviolet, Tolerancing, Photomasks, Monochromatic aberrations, Optical lithography, Optical calibration, Scanners, Lithography

SIGN IN TO:
  • View contact details

UPDATE YOUR PROFILE
Is this your profile? Update it now.
Don’t have a profile and want one?

Advertisement
Advertisement
Back to Top