HeeHong Yang
Sr. Manager of Design Integration at Headway Technologies Inc
SPIE Involvement:
Author
Publications (3)

Proceedings Article | 1 April 2008 Paper
Proceedings Volume 6924, 69241H (2008) https://doi.org/10.1117/12.773021
KEYWORDS: Optical proximity correction, Scanning electron microscopy, Illumination engineering, Resolution enhancement technologies, Bridges, Printing, Aberration correction, Semiconducting wafers, Algorithm development, Manufacturing

Proceedings Article | 8 November 2005 Paper
Proceedings Volume 5992, 599230 (2005) https://doi.org/10.1117/12.632344
KEYWORDS: Photomasks, Lithography, Optical proximity correction, Silicon, Calibration, Scanning electron microscopy, Semiconducting wafers, Semiconductors, Optical inspection, Reticles

Proceedings Article | 22 August 2001 Paper
Gyu-Ho Lyu, Chang-Hwan Kim, Suk-Joo Lee, Hee-Hong Yang, Dae-Yup Lee, Ji-Yong Yoo, Jeong-Woo Lee, Yoo-Hyon Kim, Jeong-Lim Nam, Woo-Sung Han
Proceedings Volume 4344, (2001) https://doi.org/10.1117/12.436747
KEYWORDS: Critical dimension metrology, Absorption, Photoresist materials, Deep ultraviolet, Photoresist processing, Resistance, Etching, Copper, Optical lithography, Reflection

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