Prof. Hideyoshi Takamizawa Profile

Prof. Hideyoshi Takamizawa

at Dai Nippon Printing Co Ltd

SPIE Involvement:

Author

Publications (10)

Proceedings Article | 28 July 2014 Paper

Proximity corrected accurate in-die registration metrology

M. Daneshpanah, F. Laske, M. Wagner, K.-D. Roeth, S. Czerkas, H. Yamaguchi, N. Fujii, S. Yoshikawa, K. Kanno, H. Takamizawa

Proceedings Volume 9256, 92560F (2014) https://doi.org/10.1117/12.2072074

KEYWORDS: Photomasks, Metrology, Semiconducting wafers, Model-based design, Near field optics, Reticles, Autoregressive models, Overlay metrology, Systems modeling, Logic

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Proceedings Article | 28 July 2014 Paper

Study of the mask materials for PTD process and NTD process in practical ArF immersion lithography

Takashi Adachi, Ayako Tani, Katsuya Hayano, Hideyoshi Takamizawa

Proceedings Volume 9256, 92560B (2014) https://doi.org/10.1117/12.2070056

KEYWORDS: Optical proximity correction, Photomasks, Nanoimprint lithography, Lithography, Image processing, Finite-difference time-domain method, Image enhancement, Metals, Photoresist processing, Immersion lithography

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Proceedings Article | 28 July 2014 Paper

Evaluation of AIMS D2DB simulation without calibration images

Masaharu Nishiguchi, Kouichi Kanno, Katsuya Hayano, Hideyoshi Takamizawa, Kana Ohara, Donghwan Son, Vikram Tolani

Proceedings Volume 9256, 925605 (2014) https://doi.org/10.1117/12.2070026

KEYWORDS: Calibration, Photomasks, SRAF, Opacity, Optical proximity correction, Lithography, Critical dimension metrology, Deep ultraviolet, Metals, Semiconducting wafers

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Proceedings Article | 30 June 2012 Paper

A study of hot spot measurement on WLCD

Hidemichi Imai, Shingo Yoshikawa, Hideyoshi Takamizawa, Ute Buttgereit, Thomas Thaler

Proceedings Volume 8441, 844107 (2012) https://doi.org/10.1117/12.978706

KEYWORDS: Photomasks, Semiconducting wafers, Critical dimension metrology, 193nm lithography, Process control, Current controlled current source, Optical lithography, Extreme ultraviolet lithography, Lithography

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Proceedings Article | 20 May 2011 Paper

22nm node ArF lithography performance improvement by utilizing mask 3D topography: controlled sidewall angle

Hiroshi Watanabe, Kei Mesuda, Katsuya Hayano, Eiji Tsujimoto, Hideyoshi Takamizawa, Toshio Ohhashi, Naruo Sakasai, Shintaro Kudo, Tomoyuki Matsuyama

Proceedings Volume 8081, 808108 (2011) https://doi.org/10.1117/12.899910

KEYWORDS: Photomasks, Lithography, Semiconducting wafers, Printing, Chromium, Etching, Resolution enhancement technologies, Source mask optimization, Binary data, Critical dimension metrology

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Proceedings Article | 20 May 2011 Paper

Mask blank material optimization impact on leading-edge ArF lithography

Kei Mesuda, Hiroshi Watanabe, Katsuya Hayano, Eiji Tsujimoto, Hideyoshi Takamizawa, Toshio Ohhashi, Naruo Sakasai, Shintaro Kudo, Tomoyuki Matsuyama

Proceedings Volume 8081, 808102 (2011) https://doi.org/10.1117/12.899909

KEYWORDS: Lithography, Photomasks, Source mask optimization, SRAF, Resolution enhancement technologies, Head, Error analysis, Refractive index, Scanning electron microscopy, Lithographic illumination

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Proceedings Article | 26 May 2010 Paper

Productivity improvement of high resolution inspection mode on TeraScan 597XR

Hidemichi Imai, Takeshi Kosuge, Kei Mesuda, Eiji Tsujimoto, Hideyoshi Takamizawa

Proceedings Volume 7748, 77480Q (2010) https://doi.org/10.1117/12.867983

KEYWORDS: Inspection, Pellicles, Opacity, Photomasks, Image transmission, Signal to noise ratio, SRAF, Databases, Image resolution, Defect inspection

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Proceedings Article | 19 May 2008 Paper

Photomask technology for 32nm node and beyond

Ryugo Hikichi, Hiroyuki Ishii, Hidekazu Migita, Noriko Kakehi, Mochihiro Shimizu, Hideyoshi Takamizawa, Tsugumi Nagano, Masahiro Hashimoto, Hiroyuki Iwashita, Toshiyuki Suzuki, Morio Hosoya, Yasushi Ohkubo, Masao Ushida, Hideaki Mitsui

Proceedings Volume 7028, 702805 (2008) https://doi.org/10.1117/12.793014

KEYWORDS: Chromium, Photomasks, Etching, Binary data, Image processing, Photoresist processing, Photomask technology, Lithography, Multilayers, Absorbance

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Proceedings Article | 20 October 2006 Paper

Multi-layer resist system for 45-nm-node and beyond: part I

M. Hashimoto, H. Shiratori, K. Horii, Y. Yokoya, Y. Ohkubo, H. Takamizawa, Y. Fujimura, J. Morimoto, A. Manoshiro, M. Shimizu, T. Yokoyama, T. Enomoto, M. Nagai

Proceedings Volume 6349, 63490I (2006) https://doi.org/10.1117/12.693131

KEYWORDS: Etching, Chromium, Photoresist processing, SRAF, Diffusion, Scanning electron microscopy, Standards development, Chemically amplified resists, Photomasks, Optical lithography

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Proceedings Article | 20 October 2006 Paper

Multi-layer resist system for 45-nm-node and beyond: Part II

Yukihiro Fujimura, Jumpei Morimoto, Asuka Manoshiro, Mochihiro Shimizu, Hideyoshi Takamizawa, Masahiro Hashimoto, Hiroshi Shiratori, Katsuhiko Horii, Yasunori Yokoya, Yasushi Ohkubo, Tomoyuki Enomoto, Takahiro Sakaguchi, Masaki Nagai

Proceedings Volume 6349, 634936 (2006) https://doi.org/10.1117/12.692896

KEYWORDS: Etching, Dry etching, Resistance, Photoresist processing, Coating, Photomasks, Chromium, Fluorine, Ultraviolet radiation, Scanning electron microscopy

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Showing 5 of 10 publications

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