Dr. Jae-Hyun Kim
Vice President at Dongjin Semichem Co Ltd
SPIE Involvement:
Author
Publications (31)

Proceedings Article | 27 March 2014 Paper
Dong-Gyun Kim, Su-Jee Kwon, Suk-Koo Hong, Joon Je Lee, Hyung Rae Lee, Hyo-jin Yun, Ji-Hoon Baik, Dohyuk Im, Eujean Jang, Jae-Woo Lee, Jae-Hyun Kim, Jong-Chan Lee
Proceedings Volume 9051, 905126 (2014) https://doi.org/10.1117/12.2048674
KEYWORDS: Polymers, Photoresist materials, Lithography, Photoresist developing, Nitrogen, Particle swarm optimization, Polymerization, Photoresist processing, Scanning electron microscopy, Etching

Proceedings Article | 16 April 2011 Paper
Proceedings Volume 7972, 79721Q (2011) https://doi.org/10.1117/12.879581
KEYWORDS: Photoresist materials, Polymers, Photoresist developing, Critical dimension metrology, Bottom antireflective coatings, Lithography, Reflectivity, Double patterning technology, Etching, Temperature metrology

Proceedings Article | 31 March 2010 Paper
Jae Hyun Kim, Sung Il Ahn, Jin Goo Yoon, Youngho Kim, Seung-Ki Chae, Wang-Cheol Zin
Proceedings Volume 7639, 76391P (2010) https://doi.org/10.1117/12.858362
KEYWORDS: Photoresist materials, Interfaces, Reflectivity, Molecules, X-rays, Polymers, Molecular interactions, Polymer thin films, Lithography, Thin films

Proceedings Article | 23 March 2010 Paper
Proceedings Volume 7636, 76362Y (2010) https://doi.org/10.1117/12.846518
KEYWORDS: Diffusion, Polymers, Extreme ultraviolet lithography, Line width roughness, Extreme ultraviolet, Deep ultraviolet, Line edge roughness, Optical lithography, Semiconducting wafers, Chemically amplified resists

Proceedings Article | 1 April 2009 Paper
Jeongsik Kim, Jae-Woo Lee, Deogbae Kim, Jaehyun Kim, Sung-Il Ahn, Wang-Cheol Zin
Proceedings Volume 7273, 72732W (2009) https://doi.org/10.1117/12.814449
KEYWORDS: X-rays, Reflectivity, Glasses, Line width roughness, Extreme ultraviolet lithography, Lithography, Extreme ultraviolet, Chemical analysis, Molecular interactions, Polymers

Proceedings Article | 4 December 2008 Paper
Proceedings Volume 7140, 71401N (2008) https://doi.org/10.1117/12.804570
KEYWORDS: Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Refractive index, Carbon, Ruthenium, Ultraviolet radiation, Lithography, Silicon, Molybdenum

Proceedings Article | 26 March 2008 Paper
Proceedings Volume 6923, 69232T (2008) https://doi.org/10.1117/12.776801
KEYWORDS: Reflectivity, Etching, Refractive index, Semiconductors, Photoresist processing, Polymers, Lithography, Photorefractive polymers, Photoresist materials, Materials processing

Proceedings Article | 3 April 2007 Paper
Sang Soo Kim, Jeong Woo Kim, Jung Youl Lee, Seung Keun Oh, Sang Hyang Lee, Jung Woo Kim, Jae Woo Lee, Deog bae Kim, Jaehyun Kim, Keun Do Ban, Cheol Kyu Bok, Seoung-Chan Moon
Proceedings Volume 6519, 65191W (2007) https://doi.org/10.1117/12.711657
KEYWORDS: Polymers, Polymerization, Line width roughness, Immersion lithography, Palladium, Line edge roughness, Photoresist processing, Promethium, Polymer thin films, Semiconducting wafers

Proceedings Article | 23 March 2007 Paper
Proceedings Volume 6519, 651947 (2007) https://doi.org/10.1117/12.711951
KEYWORDS: Polymers, Line edge roughness, Lithography, Diffusion, Extreme ultraviolet lithography, Molecules, Image resolution, Photoresist processing, Reflectivity, Image processing

Proceedings Article | 23 March 2007 Paper
Sang Hyang Lee, Jung Woo Kim, Jeong Woo Kim, Seung Keun Oh, Chan Sik Park, Jung Youl Lee, Sang Soo Kim, Jae Woo Lee, Deogbae Kim, Jaehyun Kim, Keun Do Ban, Cheol Kyu Bok, Seung Chan Moon
Proceedings Volume 6519, 651925 (2007) https://doi.org/10.1117/12.711889
KEYWORDS: Polymers, Semiconducting wafers, Fluorine, Immersion lithography, Semiconductors, Polymer thin films, Photoresist materials, Lithography, Manufacturing, Silicon

Proceedings Article | 11 April 2006 Paper
Jae Woo Lee, Seung Keun Oh, Jung Woo Kim, Sang Hyang Lee, Young Ho Jeong, Sang Soo Kim, Myoung Hwan Park, Deogbae Kim, Jaehyun Kim, Geunsu Lee, Seung-Chan Moon
Proceedings Volume 6153, 615321 (2006) https://doi.org/10.1117/12.655477
KEYWORDS: Polymers, Molecules, Digital watermarking, Photoresist processing, Liquids, Polymer thin films, Water, Optical lithography, Molecular interactions, Glasses

Proceedings Article | 11 April 2006 Paper
Sung Il Ahn, Jae Hyun Kim, Wang-Cheol Zin
Proceedings Volume 6153, 615326 (2006) https://doi.org/10.1117/12.676283
KEYWORDS: Photoresist materials, Diffusion, Atomic force microscopy, Immersion lithography, Polymers, Line edge roughness, Polymer thin films, Water, Edge roughness, Absorption

Proceedings Article | 29 March 2006 Paper
Jae Hyun Kim, Namuk Choi, Young-Ho Kim, Tae-Sung Kim
Proceedings Volume 6153, 615337 (2006) https://doi.org/10.1117/12.655777
KEYWORDS: Line edge roughness, Lithography, 193nm lithography, Scanning electron microscopy, Photoresist materials, Polymers, Optical lithography, Transparency, Semiconductors, Etching

Proceedings Article | 29 March 2006 Paper
Kwanghwyi Im, Jin Jegal, Jungkook Park, Deogbae Kim, Jaehyun Kim
Proceedings Volume 6153, 61533Q (2006) https://doi.org/10.1117/12.655458
KEYWORDS: Polymers, Line width roughness, Lithography, Electroluminescence, Deep ultraviolet, Photoresist processing, Photomasks, Scanning electron microscopy, Temperature metrology, Chemically amplified resists

Proceedings Article | 29 March 2006 Paper
Seung Keun Oh, Eun Kyung Son, Chan Sik Park, Jung Youl Lee, Jeong Woo Kim, Jae Woo Lee, Deog Bae Kim, Jaehyun Kim, Geunsu Lee, Seung-Chan Moon
Proceedings Volume 6153, 615335 (2006) https://doi.org/10.1117/12.655449
KEYWORDS: Polymers, Diffusion, Critical dimension metrology, Molecules, Photoresist processing, Monochromatic aberrations, Semiconducting wafers, Semiconductors, Lithography, Photoresist materials

Proceedings Article | 4 May 2005 Paper
Proceedings Volume 5753, (2005) https://doi.org/10.1117/12.598615
KEYWORDS: Diffusion, Polymers, Photoresist materials, Optical lithography, Electrodes, Lithography, Semiconducting wafers, Resistance, Optical proximity correction, Quenching (fluorescence)

Proceedings Article | 4 May 2005 Paper
Proceedings Volume 5753, (2005) https://doi.org/10.1117/12.598618
KEYWORDS: Polymers, Water, Photoresist materials, Immersion lithography, Polymer thin films, Diffusion, Liquids, Photoresist processing, Refractive index, Optical lithography

Proceedings Article | 14 May 2004 Paper
Sangwoong Yoon, Myungsun Kim, Hong Lee, Do Kim, Young Hoon Kim, Boo Deuk Kim, Jae Hyun Kim, Kyung-Mee Kim, Shi Yong Lee, Young Ho Kim, Sang-Mun Chon
Proceedings Volume 5376, (2004) https://doi.org/10.1117/12.533950
KEYWORDS: Line edge roughness, Lithography, Palladium, Polymers, Ultraviolet radiation, Polymerization, Manganese, Photoresist materials, Sensors, Critical dimension metrology

Proceedings Article | 14 May 2004 Paper
Seung Keun Oh, Jong Yong Kim, Jae Woo Lee, Deogbae Kim, Jaehyun Kim, Geunsu Lee, Jae Chang Jung, Cheol Kyu Bok, Ki Soo Shin
Proceedings Volume 5376, (2004) https://doi.org/10.1117/12.534665
KEYWORDS: Polymers, Critical dimension metrology, Diffusion, Polymer thin films, Temperature metrology, Photoresist materials, Photoresist processing, Semiconducting wafers, Semiconductors, Lithography

Proceedings Article | 14 May 2004 Paper
Jae Hyun Kim, Chang Ho Lee, Seok Bong Park, Won Mi Kim, Sang Sik Moon, Kyung-Mee Kim, Shi Yong Lee, Sangwoong Yoon, Young Ho Kim, Sang-Mun Chon
Proceedings Volume 5376, (2004) https://doi.org/10.1117/12.533880
KEYWORDS: Diffusion, Photoresist materials, Line edge roughness, Polymers, Atomic force microscopy, Temperature metrology, Scanning electron microscopy, Photoresist developing, Lithography, Glasses

Proceedings Article | 14 May 2004 Paper
Shi Yong Lee, Myungsun Kim, Sangwoong Yoon, Kyung-Mee Kim, Jae Hyun Kim, Hyun-Woo Kim, Sang-Gyun Woo, Young Ho Kim, Sang-Mun Chon, Takahiro Kishioka, Yasuhisa Sone, Yasuyuki Nakajima
Proceedings Volume 5376, (2004) https://doi.org/10.1117/12.533884
KEYWORDS: Scanning electron microscopy, Reflectivity, Critical dimension metrology, Inspection, Polymers, Silicon, Optical lithography, Time metrology, Lithography, Line edge roughness

Proceedings Article | 14 May 2004 Paper
Proceedings Volume 5376, (2004) https://doi.org/10.1117/12.534675
KEYWORDS: Polymers, Photoresist processing, Lithography, Photoresist materials, Diffusion, Semiconducting wafers, Silicon, Photorefractive polymers, Scanning electron microscopy, Electronic components

Proceedings Article | 14 May 2004 Paper
Proceedings Volume 5376, (2004) https://doi.org/10.1117/12.534999
KEYWORDS: Polymers, Mask making, Lithography, Chemistry, Line edge roughness, Photomasks, Electron beam lithography, Reticles, Polymethylmethacrylate, Extreme ultraviolet lithography

Proceedings Article | 12 June 2003 Paper
Yong-Jun Choi, Jung-woo Kim, Jong-Yong Kim, Yoon-Gil Yim, Jae-Hyun Kim, Jaechang Jung, Myoung-Ja Min, Cheolkyu Bok, Kisoo Shin
Proceedings Volume 5039, (2003) https://doi.org/10.1117/12.485160
KEYWORDS: Polymers, Polymer thin films, Lithography, 193nm lithography, Silicon, Photoresist materials, Photoresist processing, Water, Semiconducting wafers, Photorefractive polymers

Proceedings Article | 12 June 2003 Paper
Deogbae Kim, Hyun-Jin Kim, Sook-Hee Cho, Dong-Hwal Lee, Kwang-Hyi Im, Min-Ja Yoo, Sang-Hyang Lee, Jaehyun Kim, Jin-Soo Kim, Hyeong-Soo Kim
Proceedings Volume 5039, (2003) https://doi.org/10.1117/12.485161
KEYWORDS: Diffusion, Lithography, Polymers, Silicon, Line edge roughness, Chemically amplified resists, Photoresist processing, Semiconducting wafers, Coating, Etching

Proceedings Article | 12 June 2003 Paper
Proceedings Volume 5039, (2003) https://doi.org/10.1117/12.485163
KEYWORDS: Diffusion, Electroluminescence, Polymers, Polymer thin films, Lithography, Semiconducting wafers, Silicon films, Molecules, Silicon, Chemically amplified resists

Proceedings Article | 24 July 2002 Paper
Geunsu Lee, Keun-Kyu Kong, Jae Chang Jung, Ki-Soo Shin, Jae-Hyun Kang, Sang-Don Kim, Yong-Jun Choi, Se-Jin Choi, Deog-Bae Kim, Jae-Hyun Kim
Proceedings Volume 4690, (2002) https://doi.org/10.1117/12.474211
KEYWORDS: Photoresist materials, Polymers, Diffusion, Line edge roughness, Contamination, Ions, Hydrogen, Photoresist developing, Etching, Lithography

Proceedings Article | 24 July 2002 Paper
Proceedings Volume 4690, (2002) https://doi.org/10.1117/12.474185
KEYWORDS: Etching, Lithography, Reflectivity, Refractive index, Polymers, Photoresist processing, Chromophores, Bottom antireflective coatings, Polymer thin films, Photorefractive polymers

Proceedings Article | 24 July 2002 Paper
Yang-Sook Kim, Yun-Hyi Kim, Sang-Hyang Lee, Yun-Gill Yim, Deog-Bae Kim, Jae-Hyun Kim
Proceedings Volume 4690, (2002) https://doi.org/10.1117/12.474285
KEYWORDS: Line edge roughness, Chromophores, Diffusion, Lithography, Absorption, 193nm lithography, Scanning electron microscopy, Ultraviolet radiation, Deep ultraviolet, Polymers

Proceedings Article | 24 July 2002 Paper
Hyun-Jin Kim, Yoon-Sik Chung, Dong Lee, Sook Cho, Kwang Im, Yun-Gill Yim, Deog-Bae Kim, Jae-Hyun Kim
Proceedings Volume 4690, (2002) https://doi.org/10.1117/12.474265
KEYWORDS: Polymers, Lithography, Line edge roughness, Polymerization, Transmittance, Scanning electron microscopy, Etching, Manganese, Chemically amplified resists, Edge roughness

Proceedings Article | 24 July 2002 Paper
Yoon-Sik Chung, Hyun-Jin Kim, Sook Cho, Dong Lee, Kwang Im, Yun-Gill Yim, Deog-Bae Kim, Jae-Hyun Kim
Proceedings Volume 4690, (2002) https://doi.org/10.1117/12.474266
KEYWORDS: Polymers, Line edge roughness, Carbonates, Lithography, Interfaces, Hydrogen, Molecules, Annealing, Diffusion, Chemically amplified resists

Showing 5 of 31 publications
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