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James Lee
at ASML Korea Co Ltd
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Author
Publications (4)
Proceedings Article | 10 April 2024 Presentation + Paper
Improving EUV sub-40nm via single patterning using wavefront and pupil co-optimization
Soojung Kim, No Young Chung, Kwangseok Maeng, Hyunjae Cho, Jerry Lim, Hyungrok Jang, Jae Hyoung Kim, Insung Kim, Eelco van Setten, Hidde Keizers, Ajinkya Patil, Steven Beekmans, Jungtae Lee, Ki-Seok Kim, James Lee, Sung-Woon Park, Jialei Tang, Stephen Hsu, Youping Zhang, Paul Derks
Proceedings Volume 12953, 1295306 (2024) https://doi.org/10.1117/12.3009878
KEYWORDS: Wavefronts, Extreme ultraviolet, Extreme ultraviolet lithography, Light sources and illumination, Stochastic processes, Diffraction, Optical lithography, Source mask optimization, Projection systems
Proceedings Article | 10 April 2024 Poster + Paper
Diffraction-based metrology for dose monitoring and control
Proceedings Volume 12955, 129553E (2024) https://doi.org/10.1117/12.3010991
KEYWORDS: Semiconducting wafers, Metrology, Critical dimension metrology, Diffraction, Scanners, Dose control, Design, Wafer level optics, Optical sensing, Diffraction gratings
Proceedings Article | 20 March 2020 Paper
Enabling accurate and robust optical metrology of in device overlay
Min-Seok Kang, Chan Hwang, Seungyoon Lee, Jeongjin Lee, Joon-Soo Park, Christian Leewis, Eun-Ji Yang, Do-Haeng Lee, James Lee, Sabil Huda, Noh-Kyoung Park, Anagnostis Tsiatmas, Giulio Bottegal, Amy Wang, Filippo Belletti, Jan Jitse Venselaar, Giacomo Miceli, Izabela Saj, Sam Chen
Proceedings Volume 11325, 1132529 (2020) https://doi.org/10.1117/12.2553446
KEYWORDS: Overlay metrology, Semiconducting wafers, Metrology, Measurement devices, Optical metrology, Etching, Scanners, Diffractive optical elements, Wafer testing, Optical testing
Proceedings Article | 20 March 2020 Presentation + Paper
Understanding advanced DRAM edge placement error budget and opportunities for control
Jaeseung Jeong, Jinho Lee, Jinsun Kim, Sunyoung Yea, Chan Hwang, Seung Yoon Lee, Jeongjin Lee, Joonsoo Park, Peter Nikolsky, Daniel Park, Antonio Corradi, Hyun-Woo Yu, Sun-Wook Jung, Denis Ovchinnikov, Vadim Timoshkov, Isabel de la Fuente Valentin, Yuxiang Yin, Kaustubh Padhye, Wim Tel, Harm Dillen, Koen Thuijs, Daan Slotboom, Miao Wang, Rhys Su, Marc Kea, Jin-Woo Lee, Yun-A Sung, Sang-Uk Kim, Young-Hoon Song, James Lee, Oh-Sung Kwon
Proceedings Volume 11325, 1132506 (2020) https://doi.org/10.1117/12.2551997
KEYWORDS: Metrology, Critical dimension metrology, Semiconducting wafers, Stochastic processes, Optical lithography, Etching, Lithography, Edge roughness
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