Dr. Jiri Cech Profile

Dr. Jiri Cech

Open Innovation, R&D Manager at MeadWestvaco Corp

SPIE Involvement:

Author | Leadership Workshop Facilitator

Area of Expertise:

microfabrication , thin films , electron microscopy , coatings , SWCNT , characterization

Profile Summary

Managing $150k Scouting, Open Innovation, and Proof-of-concept fund. Located, demonstrated & secured technical solutions with immediate, intermediate, and strategic impact on profitable growth.

Scouting for novel technologies, Open Innovation, Proof-of-concept Development, Patent Assessment, Technical Due Diligence,

Power user of Innography, Thomson Innovation, Maven, Knovel, Web-of-Science, SciFinder.

Tech Scout, R&D Manager, Micro- and Nanofabrication Engineer, Researcher, with PhD in Physics and Nanotechnology.

430+ citations, 25 journal papers, h-index: 12, 3 Patent Applications
ResearcherID: http://www.researcherid.com/rid/A-2506-2009

Specialties: R&D, nanotechnology, surface science, thin films, coatings, electron microscopy, open innovation, technology scouting, injection molding

Publications (3)

Proceedings Article | 5 May 2010 Paper

Fabrication of freestanding SWCNT networks for fast microbolometric focal plane array sensor

Jiri Cech, V. Swaminathan, P. Wijewarnasuriya, Luke Currano, Andriy Kovalskiy, H. Jain

Proceedings Volume 7679, 76792N (2010) https://doi.org/10.1117/12.855589

KEYWORDS: Sensors, Bolometers, Staring arrays, Resistance, Oxides, Infrared detectors, Infrared sensors, Temperature metrology, Silicon, Single walled carbon nanotubes

Read Abstract +

SPIE Journal Paper | 1 October 2009

Chalcogenide glass e-beam and photoresists for ultrathin grayscale patterning

Andriy Kovalskyy, Jiri Cech, Miroslav Vlcek, Christopher Waits, Madan Dubey, William Heffner, Himanshu Jain

JM3, Vol. 8, Issue 04, 043012, (October 2009) https://doi.org/10.1117/12.10.1117/1.3273966

KEYWORDS: Etching, Thin films, Photoresist materials, Silicon, Fresnel lenses, Reactive ion etching, Chalcogenide glass, Arsenic, Photomasks, Silver

Read Abstract +

Proceedings Article | 1 April 2009 Paper

Chalcogenide glass thin film resists for grayscale lithography

A. Kovalskiy, J. Cech, C. Tan, W. Heffner, E. Miller, C. Waits, M. Dubey, W. Churaman, M. Vlcek, H. Jain

Proceedings Volume 7273, 72734A (2009) https://doi.org/10.1117/12.811646

KEYWORDS: Thin films, Etching, Silicon, Fresnel lenses, Silver, Photoresist materials, Photomasks, Polymers, Grayscale lithography, Glasses

Read Abstract +

View contact details

UPDATE YOUR PROFILE

Is this your profile? Update it now.

Sign into your SPIE.org account

Don’t have a profile and want one?

Create an account on SPIE.org

Keywords/Phrases

Search In:

Publication Years