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Ju-Wang Hsu
at Taiwan Semiconductor Manufacturing Co Ltd
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Publications (1)
Proceedings Article | 24 March 2006 Paper
Global pattern density effects on low-k trench CDs for sub-65-nm technology nodes
Ju-Wang Hsu, J. Shieh, Kelvin Doong, L. Hung, S. Lin, C. Ting, S. Jang, K. Young, M. Liang
Proceedings Volume 6152, 615205 (2006) https://doi.org/10.1117/12.656409
KEYWORDS: Etching, Critical dimension metrology, Photomasks, Metals, Cadmium sulfide, Semiconducting wafers, Plasma, Scanning electron microscopy, Lithography, Optical lithography
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