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Junichi Watanabe
at Toppan Printing Co Ltd
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Publications (1)
Proceedings Article | 11 May 2009 Paper
Investigation of the development process for high-precision patterning
Junichi Watanabe, Tsukasa Yamazaki, Masahito Tanabe, Toru Komizo, Amy Zweber, Adam Smith
Proceedings Volume 7379, 73790B (2009) https://doi.org/10.1117/12.824252
KEYWORDS: Standards development, SRAF, Optical lithography, Photomasks, Manufacturing, Resolution enhancement technologies, Semiconductors, Photomask technology, Photoresist processing, Critical dimension metrology
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