Karl Park
at Applied Materials
SPIE Involvement:
Author
Publications (1)

Proceedings Article | 10 April 2024 Presentation + Paper
Taekwon Jee, Joonsang You, Hong-Goo Lee, Seungmo Hong, Jonghoi Cho, Taeseop Lee, Jong-hyun Seo, Michael Shifrin, Ronnie Porat, Amir Rosen, Rohit Kumar Singh, Jeong-Ho Yeo, Younghoon Kim, Jun Park, Byung-Jo Lim, Chan-Hee Kwak
Proceedings Volume 12955, 129550P (2024) https://doi.org/10.1117/12.3010813
KEYWORDS: Overlay metrology, Critical dimension metrology, Metrology, Semiconducting wafers, Stochastic processes, Time metrology, Design, Data modeling, Process control, Optical lithography

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