Ken-Huan Ho
at Nanya Technology Corp
SPIE Involvement:
Author
Publications (1)

Proceedings Article | 10 April 2024 Presentation + Paper
Proceedings Volume 12955, 129551A (2024) https://doi.org/10.1117/12.3011706
KEYWORDS: Line width roughness, Metrology, Critical dimension metrology, Stochastic processes, Semiconducting wafers, Defect inspection, Measurement uncertainty, Calibration, High volume manufacturing

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