Mr. Kenji Hosoi Profile

Kenji Hosoi

at Central Glass Co Ltd

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Author

Publications (3)

Proceedings Article | 18 April 2017 Presentation + Paper

Double-deprotected chemically amplified photoresists (DD-CAMP): higher-order lithography

William Earley, Deanna Soucie, Kenji Hosoi, Arata Takahashi, Takashi Aoki, Brian Cardineau, Koichi Miyauchi, Jay Chun, Michael O'Sullivan, Robert Brainard

Proceedings Volume 10146, 101460H (2017) https://doi.org/10.1117/12.2258324

KEYWORDS: Photoresist materials, Extreme ultraviolet, Lithography, Extreme ultraviolet lithography, Polymers, Line width roughness, Solids, Polymerization, Sodium, Glasses

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Proceedings Article | 20 March 2012 Paper

Synthesis of stable acid amplifiers that produce strong highly-fluorinated polymer-bound acid

Kenji Hosoi, Brian Cardineau, William Earley, Seth Kruger, Koichi Miyauchi, Robert Brainard

Proceedings Volume 8325, 83251S (2012) https://doi.org/10.1117/12.917018

KEYWORDS: Polymers, Amplifiers, Line edge roughness, Extreme ultraviolet lithography, Extreme ultraviolet, Lithography, Diffusion, Glasses, Molecules, Neck

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Proceedings Article | 20 March 2012 Paper

Stable, fluorinated acid amplifiers for use in EUV lithography

Seth Kruger, Kenji Hosoi, Brian Cardineau, Koichi Miyauchi, Robert Brainard

Proceedings Volume 8325, 832514 (2012) https://doi.org/10.1117/12.917015

KEYWORDS: Amplifiers, Fluorine, Line edge roughness, Extreme ultraviolet lithography, Lithography, Polymers, Photoresist materials, Polymerization, Temperature metrology, Extreme ultraviolet

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