CONFERENCE PROCEEDINGS
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Kotaro Ooishi
at Tokyo Electron Kyushu Ltd
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Author
Publications (5)
Proceedings Article | 20 October 2006 Paper
More evolved PGSD (proximity gap suction developer) for controlling movement of dissolution products
Hideaki Sakurai, Yukio Oppata, Koji Murano, Mari Sakai, Masamitsu Itoh, Hidehiro Watanabe, Hideo Funakoshi, Kotaro Ooishi, Yoshiki Okamoto, Masatoshi Kaneda, Shigenori Kamei, Naoya Hayashi
Proceedings Volume 6349, 63494J (2006) https://doi.org/10.1117/12.685740
KEYWORDS: Mask making, Photomasks, Motion controllers, Electron transport, Printing, Process engineering, Manufacturing, Semiconductor manufacturing, Semiconductors, Photomask technology
Proceedings Article | 16 June 2005 Paper
Application of PGSD (proximity gap suction development) to 70 nm NAND mask fabrication
Hideaki Sakurai, Tooru Shibata, Masamitsu Itoh, Kotaro Ooishi, Hideo Funakoshi, Yoshiki Okamoto, Shigemi Oono, Masatoshi Kaneda, Shigenori Kamei, Naoya Hayashi
Proceedings Volume 5835, (2005) https://doi.org/10.1117/12.637275
KEYWORDS: Critical dimension metrology, Error analysis, Photomasks, Mask making, Lithium, Visualization, Printing, Process engineering, Manufacturing, Semiconductor manufacturing
Proceedings Article | 28 August 2003 Paper
New development method eliminating the loading and microloading effect
Kotaro Ooishi, Yukihiko Esaki, Kazuo Sakamoto, Hideaki Sakurai, Masamitsu Itoh, Mika Nakao, Toshiharu Nishimura, Hiroyuki Miyashita, Naoya Hayashi, Shinji Tanabe, Yoshihisa Oosaki, Yasuyoshi Sasagawa
Proceedings Volume 5130, (2003) https://doi.org/10.1117/12.504050
KEYWORDS: Photomasks, Particles, Critical dimension metrology, Control systems, Printing, Electronics, Sensors, Fluctuations and noise, Humidity
Proceedings Article | 27 December 2002 Paper
Novel resist development system for photomasks
Proceedings Volume 4889, (2002) https://doi.org/10.1117/12.467260
KEYWORDS: Photoresist processing, Photomasks, Sensors, Cadmium sulfide, Critical dimension metrology, Chemically amplified resists, Etching, Microfluidics, Photomask technology, Plasma etching
Proceedings Article | 27 December 2002 Paper
Performance of proximity gap suction development (PGSD)
Hideaki Sakurai, Masamitsu Itoh, Yukihiko Esaki, Kotaro Ooishi, Kazuo Sakamoto, Mika Nakao, Toshiharu Nishimura, Hiroyuki Miyashita, Naoya Hayashi
Proceedings Volume 4889, (2002) https://doi.org/10.1117/12.467297
KEYWORDS: Critical dimension metrology, Photomasks, Cadmium, Mask making, Photoresist processing, Printing, Process engineering, Manufacturing, Semiconductor manufacturing, Semiconductors
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