Kyu-Tae Sun
at ASML Korea Co Ltd
SPIE Involvement:
Author
Publications (11)

Proceedings Article | 24 March 2016 Paper
Proceedings Volume 9778, 97781S (2016) https://doi.org/10.1117/12.2219467
KEYWORDS: Overlay metrology, Optical proximity correction, Diffraction, Critical dimension metrology, Metrology, Scanning electron microscopy, Electron microscopes, Optical lithography, Error analysis, Target detection

Proceedings Article | 24 March 2016 Paper
Hugo Cramer, Baukje Wisse, Stefan Kruijswijk, Thomas Theeuwes, Yi Song, Wei Guo, Alok Verma, Rui Zhang, Yvon Chai, Sharon Hsu, Rahul Khandelwal, Giacomo Miceli, Steven Welch, Kyu-Tae Sun, Taeddy Kim, Jin-Moo Byun, Sang-Hoon Jung, Moo-Young Seo, Hyun-Sok Kim, Dong-Gyu Park, Jong-Mun Jeong
Proceedings Volume 9778, 97782E (2016) https://doi.org/10.1117/12.2220782
KEYWORDS: Critical dimension metrology, Process control, Scatterometry, Metrology, Etching, Control systems, Scanners, Optical lithography, Semiconducting wafers, Reticles

Proceedings Article | 15 March 2016 Paper
Min-Suk Kim, Hwa-Yeon Won, Jong-Mun Jeong, Paul Böcker, Lydia Vergaij-Huizer, Michiel Kupers, Milenko Jovanović, Inez Sochal, Kevin Ryan, Kyu-Tae Sun, Young-Wan Lim, Jin-Moo Byun, Gwang-Gon Kim, Jung-Joon Suh
Proceedings Volume 9780, 97800A (2016) https://doi.org/10.1117/12.2220459
KEYWORDS: Semiconductor manufacturing, Performance modeling, Metrology, Overlay metrology, Lithography, Semiconducting wafers, Process modeling, Optical lithography, Process control, Lithium, Yield improvement, Data modeling

Proceedings Article | 8 March 2016 Paper
Jongsu Lee, Byoung-Hoon Lee, Won-Kwang Ma, Sang-Jun Han, Young-Sik Kim, Noh-Jung Kwak, Thomas Theeuwes, Wei Guo, Yi Song, Baukje Wisse, Stefan Kruijswijk, Hugo Cramer, Steven Welch, Alok Verma, Rui Zhang, Yvon Chai, Sharon Hsu, Giacomo Miceli, Kyu-Tae Sun, Jin-Moo Byun
Proceedings Volume 9778, 97782B (2016) https://doi.org/10.1117/12.2219664
KEYWORDS: Etching, Metrology, Process control, Control systems, Critical dimension metrology, Scatterometry, Optical lithography, Image processing, Scatter measurement, Measurement devices, Semiconducting wafers, Inspection

Proceedings Article | 23 October 2015 Paper
Hong-Goo Lee, Sang-Jun Han, Won-Kwang Ma, Young-Sik Kim, Noh-Jung Kwak, Paul Böcker, David Deckers, Weitian Kou, Michiel Kupers, Kevin Ryan, Elliott McNamara, Gwang-Gon Kim, Kyu-Tae Sun, Young-Wan Lim, Jin-Moo Byun, Jung-Joon Suh
Proceedings Volume 9635, 96351S (2015) https://doi.org/10.1117/12.2196879
KEYWORDS: Semiconducting wafers, Metrology, Principal component analysis, Overlay metrology, Optical alignment, Immersion lithography, Time metrology, Scanners, Semiconductor manufacturing, Diffraction

Showing 5 of 11 publications
SIGN IN TO:
  • View contact details

UPDATE YOUR PROFILE
Is this your profile? Update it now.
Don’t have a profile and want one?

Advertisement
Advertisement
Back to Top