Dr. Lantian Wang Profile

Dr. Lantian Wang

Senior CAE at Synopsys Inc

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Author

Publications (13)

Proceedings Article | 30 October 2007 Paper

LRC techniques for improved error detection throughout the process window

Venson Lee, Sheng-Hua Tsai, Jun Zhu, Lantian Wang, Shu-Mei Yang, Dan White

Proceedings Volume 6730, 67303F (2007) https://doi.org/10.1117/12.746439

KEYWORDS: Optical proximity correction, Lithography, Model-based design, Error analysis, Data modeling, Photomasks, Process modeling, Semiconducting wafers, Printing, Computer simulations

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Proceedings Article | 8 November 2005 Paper

Full-chip level MEEF analysis using model based lithography verification

Juhwan Kim, Lantian Wang, Daniel Zhang, Zongwu Tang

Proceedings Volume 5992, 59922U (2005) https://doi.org/10.1117/12.632019

KEYWORDS: Photomasks, Critical dimension metrology, Lithography, Optical lithography, Semiconducting wafers, Bridges, Data modeling, Optical proximity correction, Process modeling, Error analysis

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Proceedings Article | 5 November 2005 Paper

Full-chip poly gate critical dimension control using model based lithography verification

Daniel Zhang, Juhwan Kim, Lantian Wang, Zongwu Tang

Proceedings Volume 5992, 59925E (2005) https://doi.org/10.1117/12.632302

KEYWORDS: Critical dimension metrology, Photomasks, Optical proximity correction, Lithography, Error analysis, Semiconducting wafers, Data modeling, Control systems, Model-based design, Tolerancing

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Proceedings Article | 28 June 2005 Paper

Model-based full-chip verification for 65nm lithography process development

Juhwan Kim, Lantian Wang, Daniel Zhang, Zongwu Tang

Proceedings Volume 5853, (2005) https://doi.org/10.1117/12.617141

KEYWORDS: Lithography, Photomasks, Critical dimension metrology, Optical proximity correction, Resolution enhancement technologies, Data modeling, Optical lithography, Metals, Model-based design, Systems modeling

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Proceedings Article | 28 June 2005 Paper

Contact CD variation check and contact/metal overlay check using a model based full chip verification software tool

Lantian Wang, Juhwan Kim, Daniel Zhang, Zongwu Tang, Minghui Fan

Proceedings Volume 5853, (2005) https://doi.org/10.1117/12.617139

KEYWORDS: Critical dimension metrology, Optical proximity correction, Overlay metrology, Error analysis, Metals, Photomasks, Semiconducting wafers, Tolerancing, Data modeling, Resolution enhancement technologies

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Proceedings Article | 6 December 2004 Paper

Resolution enhancement technique optimization using model-based full-chip verification methodology for subwavelength lithography

Juhwan Kim, Minghui Fan, Lantian Wang, Timothy Tsuei, Zongwu Tang

Proceedings Volume 5567, (2004) https://doi.org/10.1117/12.569294

KEYWORDS: Optical proximity correction, Resolution enhancement technologies, Data modeling, Lithography, Optical lithography, Process modeling, Photomasks, Error analysis, Critical dimension metrology, Bridges

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Proceedings Article | 28 May 2004 Paper

Correlating reticle pinhole defects to wafer printability for the 90-nm node lithography using advanced RET

W. Shieh, William Chou, Chuen-Huei Yang, J. Wu, Noah Chen, Shih Yen, Tony Hsu, Steve Tuan, Doris Chang, Maciej Rudzinski, Lantian Wang, Kong Son

Proceedings Volume 5377, (2004) https://doi.org/10.1117/12.544243

KEYWORDS: Semiconducting wafers, Reticles, Inspection, Photomasks, Lithography, Wafer inspection, Resolution enhancement technologies, Scanning electron microscopy, Manufacturing, Critical dimension metrology

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Proceedings Article | 2 June 2003 Paper

Energy flux method for inspection of contact and VIA layer reticles

Hector Garcia, William Volk, Yalin Xiong, Sterling Watson, Zongchang Yu, Zhian Guo, Lantian Wang

Proceedings Volume 5038, (2003) https://doi.org/10.1117/12.504577

KEYWORDS: Inspection, Reticles, Defect detection, Critical dimension metrology, Semiconducting wafers, Image segmentation, Lithography, Detection and tracking algorithms, Defect inspection, Algorithm development

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Proceedings Article | 28 May 2003 Paper

Extending TeraStar reticle inspection capability to the 90-nm node through layer-specific algorithms

Maciej Rudzinski, Hector Garcia, William Volk, Lantian Wang

Proceedings Volume 5148, (2003) https://doi.org/10.1117/12.515100

KEYWORDS: Inspection, Reticles, Defect detection, Lithography, Algorithm development, Contamination, Databases, Phase shifts, Defect inspection, Photomasks

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Proceedings Article | 27 December 2002 Paper

Energy flux method for die-to-database inspection of critical layer reticles

Hector Garcia, William Volk, Yalin Xiong, Sterling Watson, Zongchang Yu, Zhian Guo, Lantian Wang

Proceedings Volume 4889, (2002) https://doi.org/10.1117/12.468207

KEYWORDS: Inspection, Reticles, Defect detection, Semiconducting wafers, Critical dimension metrology, Photomasks, Lithography, Defect inspection, Databases, Algorithm development

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Proceedings Article | 1 August 2002 Paper

Alternating phase-shift mask inspection using multiple simultaneous illumunation techniques

Larry Zurbrick, Jan Heumann, Maciej Rudzinski, Stanley Stokowski, Jan-Peter Urbach, Lantian Wang

Proceedings Volume 4754, (2002) https://doi.org/10.1117/12.476919

KEYWORDS: Inspection, Phase shift keying, Defect detection, Phase shifts, Photomasks, Defect inspection, Detection and tracking algorithms, Algorithm development, Quartz, Etching

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Proceedings Article | 11 March 2002 Paper

New approaches to alternating phase-shift mask inspection

Larry Zurbrick, Jan Heumann, Maciej Rudzinski, Stanley Stokowski, Jan-Peter Urbach, Lantian Wang

Proceedings Volume 4562, (2002) https://doi.org/10.1117/12.458285

KEYWORDS: Inspection, Phase shifts, Photomasks, Defect detection, Reticles, Etching, Quartz, Algorithm development, Image transmission, Semiconducting wafers

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Proceedings Article | 19 July 2000 Paper

Reticle defect sizing of optical proximity correction defects using SEM imaging and image analysis techniques

Larry Zurbrick, Lantian Wang, Paul Konicek, Ellen Laird

Proceedings Volume 4066, (2000) https://doi.org/10.1117/12.392037

KEYWORDS: Optical proximity correction, Scanning electron microscopy, Image analysis, Reticles, Image resolution, Image quality, 3D metrology, Electron microscopes, Photomasks, Computer aided design

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Showing 5 of 13 publications

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