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Li Wei Chen
at Macronix International Co Ltd
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Publications (1)
Proceedings Article | 4 March 2010 Paper
Novel ATHENA mark design to enhance alignment quality in double patterning with spacer process
L. W. Chen, Mars Yang, Elvis Yang, T. H. Yang, K. C. Chen, Chih-Yuan Lu
Proceedings Volume 7640, 764020 (2010) https://doi.org/10.1117/12.846014
KEYWORDS: Optical alignment, Double positive medium, Etching, Image segmentation, Photomasks, Double patterning technology, Optical lithography, Semiconducting wafers, Scanners, Signal processing
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