Mr. Ofer Lindman Profile

Ofer Lindman

Product Engineer at Applied Materials Ltd

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Author

Publications (5)

Proceedings Article | 7 March 2008 Paper

SEM-contour based mask modeling

Jim Vasek, Edita Tejnil, Ir Kusnadi, Ofer Lindman, Ovadya Menadeva, Ram Peltinov

Proceedings Volume 6924, 69244Q (2008) https://doi.org/10.1117/12.776669

KEYWORDS: Photomasks, Calibration, Data modeling, Process modeling, Optical proximity correction, Scanning electron microscopy, Semiconducting wafers, Electron beam lithography, Lithography, Reticles

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Proceedings Article | 12 April 2007 Paper

SEM-contour-based OPC model calibration through the process window

Jim Vasek, Ovadya Menedeva, Dan Levitzky, Ofer Lindman, Youval Nemadi, George Bailey, John Sturtevant

Proceedings Volume 6518, 65180D (2007) https://doi.org/10.1117/12.712232

KEYWORDS: Calibration, Optical proximity correction, Scanning electron microscopy, Process modeling, Data modeling, Databases, Metrology, Semiconducting wafers, Detection and tracking algorithms, Visualization

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Proceedings Article | 5 April 2007 Paper

CAD-based line/space mix-up prevention for reticle metrology

Thomas Marschner, Maik Enger, Frank Ludewig, Reuven Falah, Sergey Latinsky, Ofer Lindman, Thomas Coleman

Proceedings Volume 6518, 65181W (2007) https://doi.org/10.1117/12.712523

KEYWORDS: Computer aided design, Scanning electron microscopy, Photomasks, Metrology, Reticles, Pattern recognition, Binary data, Solid modeling, Semiconducting wafers, Target recognition

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Proceedings Article | 5 September 2001 Paper

Mask process design optimization based on quality mapping using standard mask inspection equipment

Shen Kuo, TaiSheng Tan, Anja Rosenbusch, Yair Eran, Ofer Lindman, Gidon Gottlib

Proceedings Volume 4409, (2001) https://doi.org/10.1117/12.438374

KEYWORDS: Critical dimension metrology, Photomasks, System on a chip, Inspection, Databases, Reticles, Inspection equipment, Cadmium, Composites, Tolerancing

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Proceedings Article | 19 July 2000 Paper

150-nm DR contact holes die-to-database inspection

Shen Kuo, Clare Wu, Yair Eran, Wolfgang Staud, Shirley Hemar, Ofer Lindman

Proceedings Volume 4066, (2000) https://doi.org/10.1117/12.392072

KEYWORDS: Inspection, Reticles, Photomasks, Semiconducting wafers, Manufacturing, Critical dimension metrology, Defect detection, Algorithm development, Ultraviolet radiation, Printing

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