Dr. Peter B. Bjoernangen
R&D Engineer at Mycronic AB
SPIE Involvement:
Author
Publications (5)

Proceedings Article | 7 March 2014 Paper
Jan-Uwe Schmidt, Ulrike Dauderstaedt, Peter Duerr, Martin Friedrichs, Thomas Hughes, Thomas Ludewig, Dirk Rudloff, Tino Schwaten, Daniela Trenkler, Michael Wagner, Ingo Wullinger, Andreas Bergstrom, Peter Bjoernangen, Fredrik Jonsson, Tord Karlin, Peter Ronnholm, Torbjorn Sandstrom
Proceedings Volume 8977, 89770O (2014) https://doi.org/10.1117/12.2036533
KEYWORDS: Spatial light modulators, Mirrors, Modulation, Imaging systems, Copper, Electrodes, Silica, Laser applications, Semiconductor lasers, Laser processing

Proceedings Article | 19 February 2009 Paper
Ulrike Dauderstädt, Per Askebjer, Peter Björnängen, Peter Dürr, Martin Friedrichs, Matthias List, Dirk Rudloff, Jan-Uwe Schmidt, Michael Müller, Michael Wagner
Proceedings Volume 7208, 720804 (2009) https://doi.org/10.1117/12.810787
KEYWORDS: Mirrors, Spatial light modulators, Electrodes, Optical lithography, Micromirrors, Laser systems engineering, Actuators, Aluminum, Deep ultraviolet, Dielectrics

Proceedings Article | 30 October 2007 Paper
J. Heber, D. Kunze, P. Dürr, D. Rudloff, M. Wagner, P. Björnängen, J. Luberek, U. Berzinsh, T. Sandström, T. Karlin
Proceedings Volume 6730, 673035 (2007) https://doi.org/10.1117/12.747015
KEYWORDS: Mirrors, Micromirrors, Optical lithography, Diffraction, Reflectivity, Photomasks, Microelectromechanical systems, Surface roughness, Deep ultraviolet, Microopto electromechanical systems

Proceedings Article | 28 May 2004 Paper
Proceedings Volume 5377, (2004) https://doi.org/10.1117/12.535767
KEYWORDS: Diffractive optical elements, Diffraction, Spatial light modulators, Manufacturing, Optics manufacturing, Phase shift keying, Quartz, Refractive index, Photomasks, Stray light

Proceedings Article | 28 May 2004 Paper
Mats Ekberg, Hans Fosshaug, Thomas Ostrom, Peter Bjornangen, Thomas Utterback, Per-Uno Skotte, John Higley, David Ruede, Oleg Kishkovich
Proceedings Volume 5377, (2004) https://doi.org/10.1117/12.535833
KEYWORDS: Photomasks, Deep ultraviolet, Molecules, Chemical analysis, Climatology, Molecular lasers, Spatial light modulators, Contamination, Optical components, Contamination control

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