Mr. Satoru Nemoto Profile

Satoru Nemoto

at Toppan Printing Co Ltd

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Publications (10)

Proceedings Article | 14 October 2011 Paper

High resolution mask process and substrate for 20nm and early 14nm node lithography

Tom Faure, Satoshi Akutagawa, Karen Badger, Louis Kindt, Jun Kotani, Takashi Mizoguchi, Satoru Nemoto, Kazunori Seki, Tasuku Senna, Richard Wistrom, Shinich Igarashi, Yukio Inazuki, Kazuhiro Nishikawa, Hiroki Yoshikawa

Proceedings Volume 8166, 816617 (2011) https://doi.org/10.1117/12.898889

KEYWORDS: Photomasks, SRAF, Opacity, Inspection, Chromium, Etching, Optical proximity correction, Photoresist processing, Resistance, Lithography

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The lithography challenges posed by the 20 nm and 14 nm nodes continue to place strict minimum feature size requirements on photomasks. The wide spread adoption of very aggressive Optical Proximity Correction (OPC) and computational lithography techniques that are needed to maximize the lithographic process window at 20 nm and 14 nm groundrules has increased the need for sub-resolution assist features (SRAFs) down to 50 nm on the mask. In addition, the recent industry trend of migrating to use of negative tone develop and other tone inversion techniques on wafer in order to use bright field masks with better lithography process window is requiring mask makers to reduce the minimum feature size of opaque features on the reticle such as opaque SRAFs. Due to e-beam write time and pattern fidelity requirements, the increased use of bright field masks means that mask makers must focus on improving the resolution of their negative tone chemically amplified resist (NCAR) process. In this paper we will describe the development and characterization of a high resolution bright field mask process that is suitable for meeting 20 nm and early 14 nm optical lithography requirements. Work to develop and optimize use of an improved chrome hard mask material on the thin OMOG binary mask blank¹ in order to resolve smaller feature sizes on the mask will be described. The improved dry etching characteristics of the new chrome hard mask material enabled the use of a very thin (down to 65 nm) NCAR resist. A comparison of the minimum feature size, linearity, and through pitch performance of different NCAR resist thicknesses will also be described. It was found that the combination of the improved mask blank and thinner NCAR could allow achievement of 50 nm opaque SRAFs on the final mask.. In addition, comparisons of the minimum feature size performance of different NCAR resist materials will be shown. A description of the optimized cleaning processes and cleaning durability of the 50 nm opaque SRAFs will be provided. Furthermore, the defect inspection results of the new high resolution mask process and substrate will be shared.

Proceedings Article | 25 September 2010 Paper

Development and characterization of a thinner binary mask absorber for 22-nm node and beyond

Tom Faure, Karen Badger, Louis Kindt, Yutaka Kodera, Toru Komizo, Shinpei Kondo, Takashi Mizoguchi, Satoru Nemoto, Kazunori Seki, Tasuku Senna, Richard Wistrom, Amy Zweber, Kazuhiro Nishikawa, Yukio Inazuki, Hiroki Yoshikawa

Proceedings Volume 7823, 78230J (2010) https://doi.org/10.1117/12.864130

KEYWORDS: Photomasks, Etching, Binary data, Opacity, Inspection, Image processing, Photoresist processing, Dry etching, Mask making, Thin films

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Proceedings Article | 23 September 2009 Paper

Post exposure bake tuning for 32nm photomasks

A. Zweber, T. Komizo, J. Levin, J. Whang, S. Nemoto, S. Kondo

Proceedings Volume 7488, 74880J (2009) https://doi.org/10.1117/12.830123

KEYWORDS: Line edge roughness, Temperature metrology, Photomasks, Etching, Diffusion, Scatterometry, Glasses, Photoresist processing, Scanning electron microscopy, Scatter measurement

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Proceedings Article | 11 May 2009 Paper

Etch characterization of binary mask dependence on mask material and resist thickness for 22nm mask fabrication

Satoru Nemoto, Thomas Faure, Richard Wistrom, Shaun Crawford, Gary Reid, Peter Bartlau, Toru Komizo, Amy Zweber

Proceedings Volume 7379, 737907 (2009) https://doi.org/10.1117/12.824248

KEYWORDS: Etching, Photomasks, Opacity, Critical dimension metrology, Dry etching, Binary data, Photoresist processing, Mask making, Standards development, Quartz

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Proceedings Article | 17 October 2008 Paper

Integrating Cr and MoSi etch for optimal photomask critical dimension uniformity and phase uniformity

Richard Wistrom, Toru Komizo, Satoru Nemoto, A. Gary Reid

Proceedings Volume 7122, 71220F (2008) https://doi.org/10.1117/12.801570

KEYWORDS: Etching, Chromium, Photomasks, Plasma etching, Quartz, Phase shift keying, Phase shifts, Plasma, Photoresist materials, Critical dimension metrology

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Proceedings Article | 17 October 2008 Paper

Characterization of binary and attenuated phase shift mask blanks for 32nm mask fabrication

Thomas Faure, Emily Gallagher, Michael Hibbs, Louis Kindt, Ken Racette, Richard Wistrom, Amy Zweber, Alfred Wagner, Yasutaka Kikuchi, Toru Komizo, Satoru Nemoto

Proceedings Volume 7122, 712209 (2008) https://doi.org/10.1117/12.801950

KEYWORDS: Photomasks, Binary data, Opacity, Chromium, Etching, Photoresist processing, Critical dimension metrology, Quartz, Phase shifts, Mask making

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Proceedings Article | 30 October 2007 Paper

Development and characterization of a new low stress molybdenum silicide film for 45 nm attenuated phase-shift mask manufacturing

Thomas Faure, Emily Gallagher, Louis Kindt, Steven Nash, Ken Racette, Richard Wistrom, Toru Komizo, Yasutaka Kikuchi, Satoru Nemoto, Yushin Sasaki, Atsushi Kominato, Toshiyuki Suzuki

Proceedings Volume 6730, 67300C (2007) https://doi.org/10.1117/12.748664

KEYWORDS: Photomasks, Etching, Distortion, Manufacturing, Line edge roughness, Photoresist processing, Dry etching, Image processing, Transmittance, Opacity

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Proceedings Article | 20 October 2006 Paper

Imaging behavior of high-transmission attenuating phase-shift mask films

Michael Hibbs, Satoru Nemoto, Toru Komizo

Proceedings Volume 6349, 63491A (2006) https://doi.org/10.1117/12.686231

KEYWORDS: Attenuators, Phase shifts, Phase shifting, 3D modeling, Diffraction, Polarization, Opacity, Refractive index, Phase measurement, Silica

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Proceedings Article | 20 May 2006 Paper

Evaluating films for high transmission attenuated phase shift masks

Satoru Nemoto, Toru Komizo, Yasutaka Kikuchi, Emily Gallagher, Jason Benz, Michael Hibbs, Takashi Haraguchi

Proceedings Volume 6283, 628322 (2006) https://doi.org/10.1117/12.681767

KEYWORDS: Etching, Reflection, Quartz, Photomasks, Phase shifts, Phase measurement, Inspection, Surface roughness, Scanning electron microscopy, Radium

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Proceedings Article | 28 June 2005 Paper

Evaluation of quartz dry etching profile for the PSM lithography performance

Toru Komizo, Satoru Nemoto, Yosuke Kojima, Takashi Ohshima, Takashi Yoshii, Toshio Konishi, Kazuaki Chiba, Yasutaka Kikuchi, Masao Otaki, Yoshimitsu Okuda

Proceedings Volume 5853, (2005) https://doi.org/10.1117/12.617440

KEYWORDS: Quartz, Photomasks, Lithography, Etching, Semiconducting wafers, Dry etching, Phase shifts, Chromium, Scanning electron microscopy, Electromagnetism

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Showing 5 of 10 publications

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