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Shibin Xu
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Publications (4)
SPIE Journal Paper | 22 January 2025
UNeXt-ILT: fast and global context-aware inverse lithography solution
Zebang Lin, Kun Ren, Dawei Gao, Yongyu Wu, Shibin Xu, Zheju Yan
JM3, Vol. 24, Issue 01, 013201, (January 2025) https://doi.org/10.1117/12.10.1117/1.JMM.24.1.013201
KEYWORDS: Lithography, Deep learning, Tunable filters, Source mask optimization, Photovoltaics, Mathematical optimization, Education and training, SRAF, Data modeling, Detection and tracking algorithms
Proceedings Article | 10 December 2024 Paper
Accurate SEM contour-based measurement and analysis of SRAM patterns for enhanced design optimization
Yongyu Wu, Miaohong Yao, Shibin Xu, Kun Ren, Dawei Gao, Xiaoci Li, Ken Chen, Qijian Wan, Chunshan Du
Proceedings Volume 13423, 1342308 (2024) https://doi.org/10.1117/12.3052330
KEYWORDS: Scanning electron microscopy, Contour extraction, Design, Transistors, Image processing, Critical dimension metrology, Electronic design automation
Proceedings Article | 10 December 2024 Paper
An efficient way towards massive CD-SEM metrology recipes based on line scan analysis: release your hands
Zhiping Mou, Kun Ren, Dawei Gao, Shibin Xu, Yanjiang Li, Chenwei Sun, Bo Pang
Proceedings Volume 13423, 1342307 (2024) https://doi.org/10.1117/12.3052328
KEYWORDS: Windows, Metrology, Scanning electron microscopy, Optical alignment, Manufacturing, Line scan image sensors, Feature extraction, Semiconducting wafers, Image quality, Analytical research
Proceedings Article | 10 December 2024 Paper
SEM contour extraction application on OPC model of contact layer
Xinyuan Zhang, Miaohong Yao, Shibin Xu, Zheju Yan, Kun Ren, Yongyu Wu, Dawei Gao, Ken Chen, Xiangshang Zhu, Chenwei Sun, Feng Shao
Proceedings Volume 13423, 134230E (2024) https://doi.org/10.1117/12.3052691
KEYWORDS: Data modeling, Optical proximity correction, Scanning electron microscopy, Performance modeling, Contour extraction, Semiconducting wafers, Image processing, Critical dimension metrology, Modeling
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