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Dr. Shuchi Ojha
at Applied Materials Inc
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Publications (1)
Proceedings Article | 30 April 2023 Presentation
Understanding the metal oxide resist and underlayer interaction for EUV lithography
Sudha Rathi, Bharati Neelamraju, Rajaram Narayanan, Shuchi Ojha, Abdul Aziz Khaja, Prashant Kulshreshtha, Praket Jha, Harry Whitesell, Karthik Janakiraman, Peiqi Wang, Larry Gao, Nancy Fung, Yung-Chen Lin
Proceedings Volume 12498, 124980P (2023) https://doi.org/10.1117/12.2658562
KEYWORDS: Oxides, Metals, Extreme ultraviolet lithography, Line width roughness, Plasma enhanced chemical vapor deposition, Surface properties, Resistance, Molybdenum, Extreme ultraviolet, Etching
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