Dr. Takashi Aoki Profile

Dr. Takashi Aoki

Chief Engineer at EUVA

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Author

Publications (16)

Proceedings Article | 23 March 2010 Paper

Contamination study on EUV exposure tools using SAGA light source (SAGA-LS)

K. Murakami, T. Yamaguchi, A. Yamazaki, N. Kandaka, M. Shiraishi, S. Matsunari, T. Aoki, S. Kawata

Proceedings Volume 7636, 76361U (2010) https://doi.org/10.1117/12.846676

KEYWORDS: Contamination, Extreme ultraviolet lithography, Extreme ultraviolet, Reflectivity, Mirrors, Carbon, Synchrotrons, Alternate lighting of surfaces, Protactinium, Light sources

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Proceedings Article | 18 March 2009 Paper

Durability of capped multilayer mirrors for high volume manufacturing extreme ultraviolet lithography tool

S. Matsunari, Y. Kakutani, T. Aoki, S. Kawata, K. Murakami

Proceedings Volume 7271, 72713R (2009) https://doi.org/10.1117/12.813640

KEYWORDS: Mirrors, Reflectivity, Extreme ultraviolet, Ions, Silicon, Light sources, Extreme ultraviolet lithography, Metals, Titanium dioxide, Oxidation

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Proceedings Article | 21 March 2008 Paper

Protection from surface oxidation of Ru capping layers for EUVL projection optics mirrors by introducing hydrocarbon gas

Keigo Koida, Masahito Niibe, Yukinobu Kakutani, Shuichi Matsunari, Takashi Aoki, Shigeru Terashima, Takahiro Nakayama, Hiromitsu Takase, Yasuaki Fukuda

Proceedings Volume 6921, 69213C (2008) https://doi.org/10.1117/12.771814

KEYWORDS: Mirrors, Reflectivity, Extreme ultraviolet, Extreme ultraviolet lithography, Bioalcohols, Carbon, Oxides, Protactinium, Oxygen, Oxidation

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Proceedings Article | 21 March 2008 Paper

Phenomenological analysis of carbon deposition rate on the multilayer mirror

Takahiro Nakayama, Hiromitsu Takase, Shigeru Terashima, Takashi Sudo, Yutaka Watanabe, Yasuaki Fukuda, Katsuhiko Murakami, Shintaro Kawata, Takashi Aoki, Shuichi Matsunari, Yukinobu Kakutani, Masahito Niibe

Proceedings Volume 6921, 69213B (2008) https://doi.org/10.1117/12.769958

KEYWORDS: Carbon, Extreme ultraviolet, Mirrors, Protactinium, Extreme ultraviolet lithography, Multilayers, Bioalcohols, Chemical species, Coating, Oxidation

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Proceedings Article | 21 March 2007 Paper

Carbon deposition on multi-layer mirrors by extreme ultra violet ray irradiation

S. Matsunari, T. Aoki, K. Murakami, Y. Gomei, S. Terashima, H. Takase, M. Tanabe, Y. Watanabe, Y. Kakutani, M. Niibe, Y. Fukuda

Proceedings Volume 6517, 65172X (2007) https://doi.org/10.1117/12.710816

KEYWORDS: Carbon, Extreme ultraviolet, Mirrors, Gases, Natural surfaces, Reflectivity, Adsorption, Protactinium, Lithography, Extreme ultraviolet lithography

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Proceedings Article | 21 March 2007 Paper

Long-term durability of a Ru capping layer for EUVL projection optics by introducing ethanol

Yukinobu Kakutani, Masahito Niibe, Yoshio Gomei, Hiromitsu Takase, Shigeru Terashima, Shuichi Matsunari, Takashi Aoki, Yasuaki Fukuda

Proceedings Volume 6517, 651731 (2007) https://doi.org/10.1117/12.711364

KEYWORDS: Extreme ultraviolet, Mirrors, Reflectivity, Bioalcohols, Extreme ultraviolet lithography, Protactinium, Ruthenium, Carbon, Oxygen, Oxidation

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Proceedings Article | 24 March 2006 Paper

New contamination experimental equipment in the NewSUBARU and evaluation of Si-capped multilayer mirrors using it

Masahito Niibe, Yukinobu Kakutani, Shigeru Terashima, Hiromitsu Takase, Yoshio Gomei, Shuichi Matsunari, Takashi Aoki, Katsuhiko Murakami, Yasuaki Fukuda

Proceedings Volume 6151, 615134 (2006) https://doi.org/10.1117/12.656845

KEYWORDS: Extreme ultraviolet, Mirrors, Reflectivity, Contamination, Extreme ultraviolet lithography, Absorption, Carbon, Protactinium, Oxygen, In situ metrology

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Proceedings Article | 24 March 2006 Paper

Study of ruthenium-capped multilayer mirror for EUV irradiation durability

Hiromitsu Takase, Shigeru Terashima, Yoshio Gomei, Masayuki Tanabe, Yutaka Watanabe, Takashi Aoki, Katsuhiko Murakami, Shuichi Matsunari, Masahito Niibe, Yukinobu Kakutani

Proceedings Volume 6151, 615135 (2006) https://doi.org/10.1117/12.657089

KEYWORDS: Silicon, Extreme ultraviolet, Ruthenium, Diffusion, Reflectivity, Protactinium, Extreme ultraviolet lithography, Oxides, Mirrors, Oxidation

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Proceedings Article | 23 March 2006 Paper

Effect of residual gas atmosphere on lifetime of Ru-capped EUVL projection optics mirror

Yukinobu Kakutani, Masahito Niibe, Yoshio Gomei, Hiromitsu Takase, Shigeru Terashima, Shuichi Matsunari, Takashi Aoki, Katsuhiko Murakami, Yasuaki Fukuda

Proceedings Volume 6151, 61510H (2006) https://doi.org/10.1117/12.656240

KEYWORDS: Reflectivity, Extreme ultraviolet, Mirrors, Protactinium, Extreme ultraviolet lithography, Projection systems, Atmospheric optics, Carbon, Lithography, Oxidation

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Proceedings Article | 6 May 2005 Paper

Reflectance change of Si- and Ru-capped Mo/Si multilayer mirrors caused by intense EUV irradiation

Yukinobu Kakutani, Masahito Niibe, Hiromitsu Takase, Shigeru Terashima, Hiroyuki Kondo, Shuichi Matsunari, Takashi Aoki, Yoshio Gomei, Yasuaki Fukuda

Proceedings Volume 5751, (2005) https://doi.org/10.1117/12.599577

KEYWORDS: Reflectivity, Extreme ultraviolet, Carbon, Protactinium, Mirrors, Extreme ultraviolet lithography, Chemical species, Oxygen, Optical filtering, Oxidation

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Proceedings Article | 6 May 2005 Paper

Characterization of capped multilayer mirrors using XPS, AES, and SIMS

Hiromitsu Takase, Yoshio Gomei, Shigeru Terashima, Hiroyuki Kondo, Takashi Aoki, Shuichi Matsunari, Masahito Niibe, Yukinobu Kakutani

Proceedings Volume 5751, (2005) https://doi.org/10.1117/12.600452

KEYWORDS: Ruthenium, Silicon, Carbon, Extreme ultraviolet lithography, Protactinium, Molybdenum, Mirrors, Oxides, Chemical analysis, Oxidation

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Proceedings Article | 6 May 2005 Paper

Apparatus for contamination control development in EUVA

Takashi Aoki, Hiroyuki Kondo, Shuichi Matsunari, Hiromitsu Takase, Yoshio Gomei, Shigeru Terashima

Proceedings Volume 5751, (2005) https://doi.org/10.1117/12.600488

KEYWORDS: Carbon, Protactinium, Extreme ultraviolet, Extreme ultraviolet lithography, Silicon, Mirrors, Oxygen, Ruthenium, Oxides, Oxidation

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Proceedings Article | 18 October 2004 Paper

A reflectance measurement system for investigating radiation damage to EUVL mirrors in NewSUBARU

Yukinobu Kakutani, Masahito Niibe, Kazuya Kakiuchi, Hiromitsu Takase, Shigeru Terashima, Hiroyuki Kondo, Shuichi Matsunari, Takashi Aoki, Yoshio Gomei, Yasuaki Fukuda

Proceedings Volume 5533, (2004) https://doi.org/10.1117/12.559395

KEYWORDS: Reflectivity, Mirrors, Protactinium, Extreme ultraviolet lithography, Extreme ultraviolet, Carbon, Optical testing, Absorption, Oxygen, Gases

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Proceedings Article | 26 June 2003 Paper

Nikon F2 exposure tool development

Soichi Owa, Yukako Matsumoto, Yasuhiro Ohmura, Shigeru Sakuma, Takashi Aoki, Jin Nishikawa, Hiroyuki Nagasaka, Takeyuki Mizutani, Naomasa Shiraishi, Kazuhiro Kido, Issei Tanaka, Jun Nagatsuka

Proceedings Volume 5040, (2003) https://doi.org/10.1117/12.485451

KEYWORDS: Pellicles, Projection systems, Photomasks, Lithography, Coating, Birefringence, Crystals, Binary data, Refractive index, Optical design

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Proceedings Article | 30 July 2002 Paper

Progress of Nikon's F2-exposure tool development

Naomasa Shiraishi, Soichi Owa, Yasuhiro Ohmura, Takashi Aoki, Yukako Matsumoto, Jin Nishikawa, Issei Tanaka

Proceedings Volume 4691, (2002) https://doi.org/10.1117/12.474607

KEYWORDS: Birefringence, Crystals, Projection systems, Optical design, Wavefronts, Lithography, Chemical species, Absorption, Combined lens-mirror systems, Calcium

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Proceedings Article | 14 September 2001 Paper

Current status of Nikon's F2 exposure tool development

Naomasa Shiraishi, Soichi Owa, Yasuhiro Ohmura, Takashi Aoki, Yukako Matsumoto, Masato Hatasawa, Takashi Mori, Issei Tanaka

Proceedings Volume 4346, (2001) https://doi.org/10.1117/12.435631

KEYWORDS: Photomasks, Projection systems, Coating, Combined lens-mirror systems, Oxygen, Lithography, Optics manufacturing, Mirrors, Optical components, Logic devices

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Showing 5 of 16 publications

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