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Vivek Mishra
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Publications (1)
Proceedings Article | 12 January 2024 Presentation + Paper
Mask registration for high-NA EUV lithography
Roman Schmeissner, Susanne Toepfer, Mikhail Poretskiy, Sven Martin, Stephan Zschaeck, Martin Steinhardt, Vivek Mishra, Cindy Zheng, Kowtilya Bijjula, Malahat Tavassoli
Proceedings Volume PC12751, PC1275104 (2024) https://doi.org/10.1117/12.2688259
KEYWORDS: Image registration, Calibration, Extreme ultraviolet, Extreme ultraviolet lithography, Scanners, Overlay metrology, Lithography, Deep ultraviolet, Photomasks, Metrology
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